Abstract:To enable low power consumption and the access speed increase, three dimensional packaging of semiconductor chips has been proposed. In particular, a high-aspect ratio through silicon via(TSV) allows short chip to chip interconnection. 4 μm diameter and aspect ratio of 7.5 via TSV has filled. The perfect via filling was achieved within 25 minutes with the increasing i rev /|i on | ratios of periodic reverse pulse current waveform. In addition, we evaluated produced cuprous ion concentration during electrodepos… Show more
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