“…It has been already reported about a successful etching of diamond in RF-activated plasma systems using various chemistries [8,9] and applying different masking materials. Aluminum is often used as masking material, but also another metals, polymers, oxides or nitrides [9] and even nanodiamond powder [5], have been investigated referring to their applicability for diamond structuring. Different gases and/or their mixtures that have been used as source of ions are mostly O 2 Ar, CF 4 , CHF 3 , SF 6 , and to a lesser extent SiCl 4 , Cl 2 .…”