2011
DOI: 10.1364/oe.20.00a119
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Vertical InGaN light-emitting diodes with a sapphire-face-up structure

Abstract: Vertical GaN-based light-emitting diodes (LEDs) were fabricated with a Si substrate using the wafer-bonding technique. Lapping and dry-etching processes were performed for thinning the sapphire substrate instead of removing this substrate using the laser lift-off technique and the thinning process associated with the wafer-bonding technique to feature LEDs with a sapphire-face-up structure and vertical conduction property. Compared with conventional lateral GaN/sapphire-based LEDs, GaN/Si-based vertical LEDs e… Show more

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Cited by 11 publications
(9 citation statements)
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“…This approach has a significant advantage in terms of substrate heat dissipation 3 , which is a key for the realization of bright and durable LEDs. However, there also exist several long-standing drawbacks such as low device yield, difficulty in separating the epitaxial layers from the singlecrystal substrate, complicated fabrication processes and so on 7,9,13 . Consequently, the search for the development of an effective heat dissipation means is intensifying to realize a robust solid-state lighting device with long life time.…”
mentioning
confidence: 99%
“…This approach has a significant advantage in terms of substrate heat dissipation 3 , which is a key for the realization of bright and durable LEDs. However, there also exist several long-standing drawbacks such as low device yield, difficulty in separating the epitaxial layers from the singlecrystal substrate, complicated fabrication processes and so on 7,9,13 . Consequently, the search for the development of an effective heat dissipation means is intensifying to realize a robust solid-state lighting device with long life time.…”
mentioning
confidence: 99%
“…Thus τy depends on the particle volume fraction f. The analytical models [153][154][155][156][157] show that kTIM of particle-filled TIM also depends on f according to Eqs. (7) and (8). Many studies [128,[180][181][182][183] have found that, as shown in Fig.…”
Section: Thermal Resistance Of Thermal Interface Materials (Tim) and Imentioning
confidence: 91%
“…where C and M are 1.31×10 -4 and 0.166, respectively [130]. This model shows that BLT of particle-filled TIM depends on the yield stress of the material τy and the applied pressure P. τy can be expressed as [179]   (8) where A and fm are the constant and maximum particle volume fraction, respectively. Thus τy depends on the particle volume fraction f. The analytical models [153][154][155][156][157] show that kTIM of particle-filled TIM also depends on f according to Eqs.…”
Section: Thermal Resistance Of Thermal Interface Materials (Tim) and Imentioning
confidence: 95%
“…However, the poor thermal conductivity and insulating substrate pose difficulties in application [4]. To deal with this issue, flip-chip technology becomes popular in recent years because it can induce high light-extraction efficiency and good heat dissipation [5][6][7]. In the flip-chip scheme, an increase of output power can be observed due to the reflector at the bottom and direct bonding of the contact pads which can reduce the shadowing effect [8,9].…”
Section: Introductionmentioning
confidence: 99%