2014
DOI: 10.1021/nl501000k
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Vertical Heterostructures of Layered Metal Chalcogenides by van der Waals Epitaxy

Abstract: We report a facile chemical vapor deposition (CVD) growth of vertical heterostructures of layered metal dichalcogenides (MX2) enabled by van der Waals epitaxy. Few layers of MoS2, WS2, and WSe2 were grown uniformly onto microplates of SnS2 under mild CVD reaction conditions (<500 °C) and the heteroepitaxy between them was confirmed using cross-sectional transmission electron microscopy (TEM) and unequivocally characterized by resolving the large-area Moiré patterns that appeared on the basal planes of micropla… Show more

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Cited by 140 publications
(141 citation statements)
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“…c) Calculated total and projected density of state for the 5‐L MoS 2 /SnS 2 heterostructure, and charge density for several states of the 1‐L MoS 2 /SnS 2 heterostructure: the valence band edge (VBE) top, a representative state within peak (a) (middle), and a mixed‐character state within peak (c), lying approximately 1.8 eV above the Fermi level (bottom). (b,c) Reproduced with permission 245. 2014, American Chemical Society.…”
Section: Preparation Methods and Characterizationsmentioning
confidence: 99%
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“…c) Calculated total and projected density of state for the 5‐L MoS 2 /SnS 2 heterostructure, and charge density for several states of the 1‐L MoS 2 /SnS 2 heterostructure: the valence band edge (VBE) top, a representative state within peak (a) (middle), and a mixed‐character state within peak (c), lying approximately 1.8 eV above the Fermi level (bottom). (b,c) Reproduced with permission 245. 2014, American Chemical Society.…”
Section: Preparation Methods and Characterizationsmentioning
confidence: 99%
“…Especially, the dangling bonds on the interface of the heterostructures by mechanical transfer procedure may adsorb other molecules such as oxygen or water, resulting in passivation which is harmful for advanced electronic devices. Therefore, there are many attempts on the epitaxial growth of heterostructures 245, 246. Jin and co‐workers245 have achieved heteroepitaxial growth of thin layers of MoS 2 , WS 2 , and WSe 2 on SnS 2 microplates via a CVD procedure employing metal chlorides and sulfide or selenium powders at low temperature (<500 °C).…”
Section: Preparation Methods and Characterizationsmentioning
confidence: 99%
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“…Then MoX2 can be epitaxial growth on SnS2 ( Figure 11). [100] However, the growth temperature of the second material should be carefully controlled to maintain good quality of SnS2 and the grown material. [100] Furthermore, Jin et al have grown MoS2 on SnS2, TaS2, and graphene with layer controllability.…”
Section: Vertical Heterostructurementioning
confidence: 99%
“…[100] However, the growth temperature of the second material should be carefully controlled to maintain good quality of SnS2 and the grown material. [100] Furthermore, Jin et al have grown MoS2 on SnS2, TaS2, and graphene with layer controllability. [101] The use of metal halide precursors at lower temperatures is more efficient for heterostructure growth, consistent with their previous work.…”
Section: Vertical Heterostructurementioning
confidence: 99%