Proceedings of the 16th International Workshop on Vertex Detectors — PoS(Vertex 2007) 2008
DOI: 10.22323/1.057.0040
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Vertex Detectors for a Super-B factory

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Cited by 4 publications
(6 citation statements)
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“…Thus full CMOS circuitry is possible such that complete signal processing chains like charge sensitive preamplifier, discriminator, shaper plus logic can be realized within the pixel cell. The response of a prototype matrix (APSEL3 [35]) to a 90 Sr β-source is shown in fig. 11(b).…”
Section: Maps-epimentioning
confidence: 99%
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“…Thus full CMOS circuitry is possible such that complete signal processing chains like charge sensitive preamplifier, discriminator, shaper plus logic can be realized within the pixel cell. The response of a prototype matrix (APSEL3 [35]) to a 90 Sr β-source is shown in fig. 11(b).…”
Section: Maps-epimentioning
confidence: 99%
“…The S/N = 23 is measured. Pixel matrices (32 × 128 pixels) with 50 µm pitch have been tested which collect the charge generated by an 55 Fe 6 keV X-ray source in one pixel [35]. Another approach uses a deep p-well [7] in a quadrupel well process called INMAPS to shield the n-wells containing PMOS transistors.…”
Section: Maps-epimentioning
confidence: 99%
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“…The development of deep N-well (DNW) monolithic active pixel sensors (MAPS) was driven by the ambitious goal of implementing advanced readout functionalities (as in hybrid pixel detectors) in a monolithic device. In the first generation of DNW MAPS [1], designed in a 130 nm CMOS technology, data sparsification and time stamping are performed at pixel level, and different readout architectures are implemented taking into account the requirements of vertex detectors at the Super B-Factory [2] and the ILC [3]. In the pixel, the charge collecting electrode (the deep N-well) is extended over a relatively large fraction of the cell area.…”
Section: Introductionmentioning
confidence: 99%
“…The R&D activity on Deep N-Well MAPS (DNW MAPS in the following) started about 5 years ago [1] with the aim of building monolithic sensors with similar functionalities as hybrid pixel systems, including data sparsification performed along with time stamping at the level of the single pixels. This requires to take full advantage of the potential of a subquartermicron CMOS technology, in order to integrate advanced analog and digital functions inside pixels with a small size (with a pitch of a few tens of a µm), as dictated by point resolution specifications of vertex detectors for the ILC [2] or the Super B-Factory [3]. On the other hand, a full CMOS design requires using PMOSFETs inside the pixels.…”
Section: Introductionmentioning
confidence: 99%