The platform will undergo maintenance on Sep 14 at about 7:45 AM EST and will be unavailable for approximately 2 hours.
2010 15th Asia and South Pacific Design Automation Conference (ASP-DAC) 2010
DOI: 10.1109/aspdac.2010.5419682
|View full text |Cite
|
Sign up to set email alerts
|

Variation tolerant logic mapping for crossbar array nano architectures

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
21
0

Year Published

2010
2010
2017
2017

Publication Types

Select...
4
2
1

Relationship

1
6

Authors

Journals

citations
Cited by 12 publications
(21 citation statements)
references
References 17 publications
0
21
0
Order By: Relevance
“…Since variation optimization using exhaustive methods is an NP-Complete problem, we propose a heuristic algorithm for efficient runtime and optimization and compare it with a Simulated Annealing framework. This work complements our previous work which addressed offline variation tolerant mapping for FET-based crossbars, with different delay models and cost functions compared to diode-based crossbars, using simulated annealing [24].…”
Section: Introductionmentioning
confidence: 57%
“…Since variation optimization using exhaustive methods is an NP-Complete problem, we propose a heuristic algorithm for efficient runtime and optimization and compare it with a Simulated Annealing framework. This work complements our previous work which addressed offline variation tolerant mapping for FET-based crossbars, with different delay models and cost functions compared to diode-based crossbars, using simulated annealing [24].…”
Section: Introductionmentioning
confidence: 57%
“…One feature we are considering including in the defect-unaware design flow is variation of the characteristics of the devices in the crossbar architectures, which has been recently introduced in defect-aware design flow [Tunc and Tahoori 2010;Ghavami et al 2010]. There are various sources of variations in the characteristics of nanoelectronic devices, for example, the low controllability of manufacturing process results in variations in nanowire geometries.…”
Section: Disscussions and Future Workmentioning
confidence: 99%
“…This will have a drastic effect on the overall yield under high defect density. A simulated annealing (SA) algorithm is used for variation tolerant mapping on a crossbar [30]. One disadvantage of this method is that it does not fit for multi-output two-level nanoscale crossbars, such as AND-OR logics.…”
Section: Previous Workmentioning
confidence: 99%