Variation of Color in Zirconium Nitride Thin Films Prepared by Reactive DC Magnetron Sputtering

Klumdoung, Pattarinee; Asanithi, Piyapong; Chaiyakun, Surasing; Limsuwan, Pichet

doi:10.4028/www.scientific.net/amr.214.320

Cited by 7 publications

(4 citation statements)

References 6 publications

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“…with different N 2 flow rates. [ 170 ] Compared to the TiN, the ZrN was found to be more color sensitive with varying N 2 partial pressure. In this context, ZrN obtained a bright golden color at a higher partial pressure of 0.3 Pa, whereas TiN attained it at 0.15 Pa. ZrN could also display a color similar to 24‐carat gold, relatively a bit more whitish.…”

Section: Surface Properties and Applications Of Tmnsmentioning

confidence: 99%

“…Because of its color sensitivity, ZrN can be used as decorative coating with different color shades. [169][170][171][172] So, it is widely used in jewelry industry. [174] Furthermore, ZrN thin film finds its applications in the areas such as biomedical, [175][176][177][178] cutting tools, [179,180] fuel cells, [181] memory cells, [182] supercapacitors, [183] solar energy collector, [184] hard coatings, [185][186][187] etc.…”

Section: Applications Of Zrn Thin Filmsmentioning

confidence: 99%

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Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Bharani

Sharma

2022

Physica Status Solidi (a)

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Transition metal nitride (TMN) thin films exhibit outstanding physical, chemical, and mechanical properties, making them best suitable for a wide variety of applications. The most commonly used technique to produce metal nitride thin films with specific properties at optimum conditions is magnetron sputtering. Considering this, this review begins with advancements in the sputtering process from basic diode sputtering to the most commonly used pulsed magnetron sputtering. Further, the literature on several TMNs deposited via magnetron sputtering is summarized, referring to several articles that have been published during the last decades. The main emphasis lies on nitride-based thin films' structural, morphological, and mechanical aspects for various applications. In addition, the influence of reactive gas flow rate, substrate temperature, layer thickness, postannealing temperature, substrate bias voltage, protective layers, the sputtering technique adopted, etc. on the quality and performance of the thin films is also focused. The overall review work can be beneficial for the students and researchers in understanding the basic sputtering phenomenon with its advancements, the relationship between deposition parameters and surface properties, and to know the current research trend for exploring several research gaps in the literature.

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Section: Surface Properties and Applications Of Tmnsmentioning

confidence: 99%

Section: Applications Of Zrn Thin Filmsmentioning

confidence: 99%

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Bharani

Sharma

2022

Physica Status Solidi (a)

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“…Moreover, it is one of the simplest and widely used methods in the industry. In the literature, the effect of the reactive sputtering gas mixture between cathodic sputtering and reactive magnetron sputtering on several zirconium nitride film structures has been studied [13,14]. The behavior of ZrN films in a bacteriological environment were also realized [15].…”

Section: Introductionmentioning

confidence: 99%

The influence of substrate bias voltage on the electrochemical properties of ZrN thin films deposited by radio-frequency magnetron sputtering: Biomedical application

Azibi

Saoula

Aknouche

2019

Journal of Electrical Engineering

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In order to study the influence of the substrate bias on the properties of ZrN thin films deposited by radio-frequency magnetron sputtering for biomedical application. Films of ZrN were grown onto 316L stainless steel substrate using radio-frequency (rf) magnetron sputtering from a pure zirconium target in Ar - N2 gas mixture. The substrate bias voltage was varied from 0 to −100 V, which produces a variation in the structural and electrochemical properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, scanning force microscopy and potentiodynamic polarization.

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“…O material depositado foi o nitreto de zircônio, sendo esse refratário, possuindo dureza elevada [11,12] e excelente resistência química, além de possuir baixa resistividade elétrica [13] e apresentar coloração dourada [14]. Recentemente, o nitreto de zircônio passou a chamar mais atenção por sua elevada resistência à corrosão, biocompatiblidade [15] e ductibilidade, comparado a outros nitretos.…”

Section: Introductionunclassified

Caracterização físico-química de filmes finos de nitreto de zircônio depositados por magnetron sputtering reativo

Maddalozzo¹,

Soares²,

Menezes³

et al. 2018

Sci. cum Ind.

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ResumoNeste trabalho, foram depositados filmes finos de nitreto de zircônio sobre substratos de carbono e silício. O nitreto de zircônio ocupa lugar de destaque como revestimento, pois possui dureza elevada, estabilidade química e térmica admiráveis, além de possuir baixa resistividade elétrica. Devido a essas características, o mesmo vem sendo amplamente aplicado como revestimento decorativo e protetor, sendo também utilizado em implantes e outros artefatos médicos devido à sua biocompatibilidade. O objetivo principal desse estudo é realizar a caracterização físico-química dos filmes finos de ZrN utilizando uma tensão de BIAS para aumentar a densidade dos mesmos, a fim de evitar a incorporação de contaminantes. Os resultados obtidos por RBS mostram que os filmes são estequiométricos (condição na qual possuem as melhores propriedades tribológicas) e possuem baixa quantidade de inclusão de impurezas, o que os caracteriza como sendo de boa qualidade. Além disso, a análise por espectroscopia Raman comprova a formação efetiva do nitreto de zircônio, e sua dureza de 15,15 GPa medida por nanoindentação encontra-se de acordo com os valores encontrados na literatura. Palavras-chaveNitreto de zircônio, magnetron sputtering, filmes finos Physical-chemical characterization of zirconium nitride thin films deposited by reactive magnetron sputtering AbstractIn this work, thin films of zirconium nitride were deposited on carbon and silicon substrates. The zirconium nitride occupies a prominent place as a coating, since it has high hardness, admirable chemical and thermal stability, besides having low electrical resistivity. Due to these characteristics, it is widely applied as a decorative and protective coating, and it is also used in implants and other medical devices due to its biocompatibility. The main objective of this study is to perform the physical-chemical characterization of the ZrN thin films using a BIAS voltage to increase its density in order to avoid the incorporation of contaminants. It is shown in results obtained by RBS that the films are stoichiometric (condition in which they have the best tribological properties) and contain a low amount of impurities, which characterizes them as being of good quality. In addition, the Raman spectroscopy analysis proves the effective formation of zirconium nitride, and its hardness of 15,15 GPa measured by nanoidentation is in accordance with the values found in the literature. KeywordsZirconium nitride, magnetron sputtering, thin films I. INTRODUÇÃO Devido a sua diversificada gama de aplicações, filmes finos como revestimentos protetores vêm ganhando espaço na ciência e na indústria. Revestimentos cerâmicos, como nitretos metálicos, carbonetos e óxidos vêm sendo utilizados na indústria metal-mecânica a fim de prolongar a vida útil frente ao desgaste das peças [1,2], e também como fins decorativos em diversos objetos [3,2]. Além disso, filmes finos estão sendo aplicados como barreiras de difusão em semicondutores [4,2], além de possibilitarem aumentar o desempenho frente ...

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Variation of Color in Zirconium Nitride Thin Films Prepared by Reactive DC Magnetron Sputtering

Cited by 7 publications

References 6 publications

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

The influence of substrate bias voltage on the electrochemical properties of ZrN thin films deposited by radio-frequency magnetron sputtering: Biomedical application

Caracterização físico-química de filmes finos de nitreto de zircônio depositados por magnetron sputtering reativo

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