The influence of substrate bias voltage on the electrochemical properties of ZrN thin films deposited by radio-frequency magnetron sputtering: Biomedical application

Abstract

In order to study the influence of the substrate bias on the properties of ZrN thin films deposited by radio-frequency magnetron sputtering for biomedical application. Films of ZrN were grown onto 316L stainless steel substrate using radio-frequency (rf) magnetron sputtering from a pure zirconium target in Ar - N2 gas mixture. The substrate bias voltage was varied from 0 to −100 V, which produces a variation in the structural and electrochemical properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, scanning force microscopy and potentiodynamic polarization.

Innovative Process to Obtain Thin Films and Micro-Nanostructured Zrn Films from a Photo-Structurable Zro2 Sol-Gel Using Rapid Thermal Nitridation

“…This technology has the potential to achieve very high quality ZrN thin films that could be deposited on non-planar substrates and is promising for a wide range of applications in which the ZrN is used e.g. biomedical applications [56,57], decorative and protective coatings [58] and as a diffusion barrier in microelectronics [59] The possibility of structuring the layers opens the way for other…”

Effects of Nitrogen Content on the Structural, Mechanical, and Corrosion Properties of ZrN Thin Films Grown on AISI 316L by Radiofrequency Magnetron Sputtering

“…The high crystalline quality of the film, which has an effect on the corrosion resistance, is one of the most important characteristics of the coatings, which can be improved by using the appropriate deposition procedure. Corrosion resistance of ZrN films can be improved by changing the coating parameters [ 40–44 ] and the PVD processes are widely used for deposition of ZrN coating with better corrosion resistance than other methods. However, there is no investigation and understanding of the effect of nitrogen percentage on the corrosion behavior, in hank's solution, of stainless steel AISI 316L coated with Zr‐N by radio frequency magnetron sputtering.…”

Highly Oriented Zirconium Nitride and Oxynitride Coatings Deposited via High‐Power Impulse Magnetron Sputtering: Crystal‐Facet‐Driven Corrosion Behavior in Domestic Wastewater

“…They demonstrated that uniform and crystalline Zr x N y thin films could be fabricated by sputtering on biodegradable metals and alloys, [ 30 ] and furthermore, the films were improved by substrate biasing. [ 31 ] The correlation between the concentration of N vacancies versus the corrosion resistance of Zr x N y films was deliberated by Pei et al [ 32 ] A relatively high content of 0.3 vacancies provided the lowest corrosion rate. Furthermore, the lowered processing pressure enhanced the hardness and corrosion inhibition as well as nitrogen vacancy incorporation.…”