Variation of color in titanium and zirconium nitride decorative thin films

Niyomsoan, S.; Grant, W. K.; Olson, D. L.; Mishra, Brajendra

doi:10.1016/s0040-6090(02)00530-8

Cited by 189 publications

(92 citation statements)

References 4 publications

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“…Such measurements include the photoluminescence of phosphors, 4 the spectral reflectance to quantify the color of decorative films, 5 and the thin film a) Authors to whom correspondence should be addressed. Electronic addresses: mitrovic@caltech.edu and gregoire@caltech.edu optical interference pattern to measure film thickness and etch rate.…”

Section: Introductionmentioning

confidence: 99%

High-throughput on-the-fly scanning ultraviolet-visible dual-sphere spectrometer

Mitrović

Cornell

Marcin

et al. 2015

Review of Scientific Instruments

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A new simple and low cost scattered transmission accessory for commercial double beam ultraviolet-visible spectrophotometers Rev. Sci. Instrum. 68, 4288 (1997); 10.1063/1.1148344 This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitationnew. We have developed an on-the-fly scanning spectrometer operating in the UV-visible and near-infrared that can simultaneously perform transmission and total reflectance measurements at the rate better than 1 sample per second. High throughput optical characterization is important for screening functional materials for a variety of new applications. We demonstrate the utility of the instrument for screening new light absorber materials by measuring the spectral absorbance, which is subsequently used for deriving band gap information through Tauc plot analysis. C 2015 AIP Publishing LLC. [http://dx

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Section: Introductionmentioning

confidence: 99%

High-throughput on-the-fly scanning ultraviolet-visible dual-sphere spectrometer

Mitrović

Cornell

Marcin

et al. 2015

Review of Scientific Instruments

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“…Typical TiN layers with resistivities below 100 µΩ cm have a golden yellow color, while films with increasing resistivities appear bronze to brown. A reflection edge in the visible region with a characteristic reflectivity minimum at about 450 nm is responsible for the golden yellow color of the pure, stoichiometric TiN, making it a popular choice for decorative coatings [85,87]. The location of the reflection edge can be affected by changes in the carrier concentration.…”

Section: Electronic and Optical Propertiesmentioning

confidence: 99%

High-resolution characterization of TiN diffusion barrier layers

Mühlbacher¹

2015

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Titanium nitride (TiN) films are widely applied as diffusion barrier layers in microelectronic devices. The continued miniaturization of such devices not only poses new challenges to material systems design, but also puts high demands on characterization techniques. To gain understanding of diffusion processes that can eventually lead to failure of the barrier layer and thus of the whole device, it is essential to develop routines to chemically and structurally investigate these layers down to the atomic scale. In the present study, model TiN diffusion barriers with a Cu overlayer acting as the diffusion source were grown by reactive magnetron sputtering on MgO(001) and thermally oxidized Si(001) substrates. Cross-sectional transmission electron microscopy (XTEM) of the pristine samples revealed epitaxial, single-crystalline growth of TiN on MgO(001), while the polycrystalline TiN grown on Si(001) exhibited a [001]-oriented columnar microstructure. Various annealing treatments were carried out to induce diffusion of Cu into the TiN layer. Subsequently, XTEM images were recorded with a high-angle annular dark field detector, which provides strong elemental contrast, to illuminate the correlation between the structure and the barrier efficiency of the single- and polycrystalline TiN layers. Particular regions of interest were investigated more closely by energy dispersive X-ray (EDX) mapping. These investigations are completed by atom probe tomography (APT) studies, which provide a three-dimensional insight into the elemental distribution at the near-interface region with atomic chemical resolution and high sensitivity. In case of the single-crystalline barrier, a uniform Cu-enriched diffusion layer of 12 nm could be detected at the interface after an annealing treatment at 1000 °C for 12 h. This excellent barrier performance can be attributed to the lack of fast diffusion paths such as grain boundaries. Moreover, density-functional theory calculations predict a stoichiometry-dependent atomic diffusion mechanism of Cu in bulk TiN, with Cu diffusing on the N-sublattice for the experimental N/Ti ratio. In comparison, the polycrystalline TiN layers exhibited grain boundaries reaching from the Cu-TiN interface to the substrate, thus providing direct diffusion paths for Cu. However, the microstructure of these columnar layers was still dense without open porosity or voids, so that the onset of grain boundary diffusion could only be found after annealing at 900 °C for 1 h. The present study shows how to combine two high resolution state-of-the-art methods, TEM and APT, to characterize model TiN diffusion barriers. It is shown how to correlate the microstructure with the performance of the barrier layer by two-dimensional EDX mapping and three-dimensional APT. Highly effective Cu-diffusion barrier function is thus demonstrated for single-crystal TiN(001) (up to 1000 °C) and dense polycrystalline TiN (900 °C)

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“…Thus, binary and ternary systems, such as TiAlN, TiZrN, TiAlZrN and TiAlVN, show important advantages with respect to hardness, wear and corrosion resistance, and the colour can be controlled either through the nitrogen content in the compound or the relative metallic content (8,9). For instance, the colour of TiAlN is determined by the relative atomic percentage of Al and Ti in the compound.…”

Section: B) Metal Nitride and Carbide Based Materials (Layered And Mumentioning

confidence: 99%

Materiales y técnicas de fase vapor para la síntesis de recubrimientos cerámicos

Albella¹,

Jimenez²,

Gómez‐Aleixandre³

et al. 2007

Bol. Soc. Esp. Ceram. Vidr.

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A survey on recent advances in the synthesis of hard ceramic coatings is given, including materials processes and techniques. Emphasis is made on the parameters which control the coating properties (crystalline structure, morphology, etc), namely arrival energy of the atoms to the growing surface and substrate temperature. Some relevant coating materials are discussed in relation to their applications either as hard protective coatings or with decorative purposes, namely: the family of metal nitrides, carbides, and oxides, in different layer structures (monolithic, multilayers and nanocomposites) and ternary compounds of the BCN system. Keywords: Ceramic coatings, physical and chemical vapour deposition, hardness. Materiales y técnicas de fase vapor para la síntesis de recubrimientos cerámicosSe hace un descripción de los avances recientes en la síntesis de recubrimientos duros de tipo cerámico, depositados mediante técnicas de deposición en fase vapor. Se dedica especial atención a los parámetros del proceso de deposición que controlan las propiedades finales de las capas (estructura cristalina, morfología, etc), tales como la energía de llegada de los átomos a las superficie en crecimiento, y la temperatura. Finalmente, se hace una revisión de los materiales más relevantes en lo que se refiere a sus aplicaciones como recubrimientos duros y protectores, o como recubrimientos decorativos, entre ellos, la familia de los nitruros, carburos y óxidos metálicos, depositados en diversos tipos de estructuras (monolíticas, multicapas y nanocomposites), y los compuestos ternarios del sistema BCN.Palabras clave: Recubrimientos cerámicos, deposición física y química de fase vapor, dureza.

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Variation of color in titanium and zirconium nitride decorative thin films

Cited by 189 publications

References 4 publications

High-throughput on-the-fly scanning ultraviolet-visible dual-sphere spectrometer

High-throughput on-the-fly scanning ultraviolet-visible dual-sphere spectrometer

High-resolution characterization of TiN diffusion barrier layers

Materiales y técnicas de fase vapor para la síntesis de recubrimientos cerámicos

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