1986
DOI: 10.1016/0040-6090(86)90212-9
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Variable wavelength, variable angle ellipsometry including a sensitivities correlation test

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Cited by 97 publications
(20 citation statements)
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“…It should be noted here that the adopted wavelength regions and the range of angles of incidence were calculated on the basis of the maximum sensitivity of the experimental ellipsometric angles  and  to the small changes in the thin-film thickness. 2,34 Data were fitted to multi-layer models using the Levenberg-Marquardt algorithm. 34,35 For thickness determination of thin polymer films, we used a two-layer model (silicon substrate/silicon oxide/polymer/ambient).…”
Section: Ellipsometrymentioning
confidence: 99%
See 1 more Smart Citation
“…It should be noted here that the adopted wavelength regions and the range of angles of incidence were calculated on the basis of the maximum sensitivity of the experimental ellipsometric angles  and  to the small changes in the thin-film thickness. 2,34 Data were fitted to multi-layer models using the Levenberg-Marquardt algorithm. 34,35 For thickness determination of thin polymer films, we used a two-layer model (silicon substrate/silicon oxide/polymer/ambient).…”
Section: Ellipsometrymentioning
confidence: 99%
“…2,34 Data were fitted to multi-layer models using the Levenberg-Marquardt algorithm. 34,35 For thickness determination of thin polymer films, we used a two-layer model (silicon substrate/silicon oxide/polymer/ambient). Note that we did not take any roughness into account for the 'soft' polymer films (roughness set to zero), as according to AFM the rms roughness was less than 0.3 nm for 2 ð 2 µm 2 scan windows and did not exceed 0.5 nm even for 10 ð 10 µm 2 scans.…”
Section: Ellipsometrymentioning
confidence: 99%
“…The MAW inversion process was done by mlnlmizing experimental 9 and 6 (or tan 9 and cos 6) versus thelr calculated values [9]. The model used included only the substrate and a homogeneous fl]m. Thls is a reasonable approximation, as the interface of a-C:H on Si includes only the native oxlde and~5 A SiCX [15], and our fllms were above I000 A thick.…”
Section: Methodsmentioning
confidence: 99%
“…Ellipsometric measurements were performed at an incidence angle of 70° and over the wavelength region of 250-1000 nm with a spectral resolution of 2 nm. The coating thickness was derived from the changes in ellipsometric parameters between the bare and coated substrates with a three-phase model (substrate-layer-air) [51]. Single-crystal (100) silicon wafers were used as substrates for the thickness measurements.…”
Section: Coatings Fabrication and Characterizationmentioning
confidence: 99%