On the insulating side of the metal-insulator transition (MIT), the study of the effect of low Temperatures <i>T</i> on the electrical transport in amorphous silicon-nickel alloys a-Si<sub>1-y</sub>Ni<sub>y</sub>:H exhibits that the electrical conductivity follows, at the beginning, the Efros-Shklovskii Variable Range Hopping regime (ES VRH) with <i>T</i><sup>-1/2</sup>. This behaviour showed that long range electron-electron interaction reduces the Density Of State of carriers (DOS) at the Fermi level and creates the Coulomb gap (CG). For <i>T</i> higher than a critical value of temperature <i>T</i><sub>C</sub>, we obtained the Mott Variable Range Hopping regime with <i>T</i><sup>-1/4</sup>, indicating that the DOS becomes almost constant in the vicinity of the Fermi level. The critical temperature <i>T</i><sub>C</sub> decreases with nickel content in the alloys