Vapor-liquid equilibriums of the hydrochloric acid-ferrous chloride-water system

Abstract

A simple technique for the measurement of total and partial vapor pressures of the hydrochloric acid-ferrous chloride-water system and a method to correlate vaporliquid equilibrium data are described. The concentration ranges investigated were 2.95 to 8.18 and 0.73 to 1.28 moles per liter for HCI and FeCk, respectively. Experimental data obtained at 70°C. fit an equation relating the partial vapor pressures of the system and the mole fractions of the components. In the temperature range 50°to 90°C ., the total and partial vapor pressures obey the Clausius-Clapeyron equation.THE HCl-FeCl2-H20 system was studied because of its importance in regenerating hydrochloric acid from chloride solutions and the lack of experimental data in the literature.

Microstructure-dependent electrochemical properties of chemical-vapor deposited poly(3,4-ethylenedioxythiophene) (PEDOT) films

“…65 The partial pressure of HCl formed during deprotonation increases with substrate temperature which results in increased molecular weights and thus conjugation lengths due to fewer ring opening acid catalyzed reactions. 76 It has been proposed that a necessary stage for polymerization is the removal of hydrogen ions from joined monomer units by either the anion of the oxidizing agent as proposed by Gleason et al, 24 by a water molecule as described by Salaneck et al 77 or possibly by additional monomer cations when insufficient water is present. It was found by Fabretto et al that for water partial pressures resulting in an overall chamber pressure of 4.0Torr and below, the polymerization of PEDOT did proceed for room temperature substrates with iron(iii)tosylate used as the oxidant.…”