V-I curves and plasma parameters in a high density DC glow discharge generated by a current-source

Granda‐Gutiérrez, E. E.; López-Callejas, Régulo; Peña‐Eguiluz, R.; Mercado-Cabrera, A.; Barocio, S. R.; Piedad‐Beneitez, A. de la; Benítez-Read, Jorge Samuel; Pacheco-Sotelo, J.O.

doi:10.1088/1742-6596/100/6/062019

Cited by 8 publications

(3 citation statements)

References 10 publications

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“…In general, the electron density also increases by increasing the nitrogen gas pressure and the dis charge current [11]. The increase of the electron den sity with gas pressure was limited to 4 Pa pressure then reduced with increasing the nitrogen gas pressure, and this was confirmed by the minimum breakdown voltage needed to ignite the discharge, according to the Pas chen law, where the ionization process is easier [12].…”

Section: Introductionmentioning

confidence: 92%

Effect of hydrogen ratio on plasma parameters of N2-H2 gas mixture glow discharge

et al. 2012

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A dc plane glow discharge in a nitrogen hydrogen (N 2 -H 2 ) gas mixture has been operated at dis charge currents of 10 and 20 mA. The electron energy distribution function (EEDF) at different hydrogen concentrations is measured. A Maxwellian EEDF is found in the positive column region, while in both cath ode fall and negative glow regions, a non Maxwellian one is observed. Langmuir electric probes are used at different axial positions, gas pressures, and hydrogen concentrations to measure the electron temperature and plasma density. The electron temperature is found to increase with increasing H 2 concentration and decrease with increasing both the axial distance from the cathode and the mixture pressure. At first, with increasing distance from the cathode, the ion density decreases, while the electron density increases; then, as the anode is further approached, they remain nearly constant. At different H 2 concentrations, the electron and ion den sities decrease with increasing the mixture pressure. Both the electron and ion densities slightly decrease with increasing H 2 concentration.

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Section: Introductionmentioning

confidence: 92%

Effect of hydrogen ratio on plasma parameters of N2-H2 gas mixture glow discharge

et al. 2012

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“…This behavior can be explained by the amount of nitrogen incorporated in the stainless steel surface. By increasing the current density of plasma discharge in the nitriding process, the population of active species (N+) in plasma near the surface of the samples is increased [20]; this phenomenon in turn allows a greater rate of incorporation of nitrogen atoms in the substrate and consequently, a greater strain level is obtained. An increase in atomic nitrogen quantity going inside to the steel also results in a greater grade of crystalline disorder and hence, a decrease of isotropic repeatability of the lattice will occur.…”

Section: Strain Grade and Crystallite Size Determinationmentioning

confidence: 99%

Effect of Nitriding Current Density on the Surface Properties and Crystallite Size of Pulsed Plasma-Nitrided AISI 316L

Díaz-Guillén¹,

Granda‐Gutiérrez²,

Vargas‐Gutiérrez³

et al. 2015

MSCE

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In this work, plasma-nitrided AISI 316L stainless steel samples were performed by ion nitriding process under pulsed direct current (DC) discharge at different current densities (1 to 2.5 mA/ cm 2). The effect of nitriding current density on the size of crystalline coherently diffracting domains (crystallite size) and strain grade was investigated using X-ray diffraction (XRD) coupled with Williamson-Hall method. Additionally, hardness and wear resistance of the nitriding layer were characterized using a Vickers indenter and pin-on-disk technique respectively. Results showed a decrease in crystallite size from 99 nm for untreated samples to 1.4 nm for samples nitrided at 2.5 mA/cm 2 promoted both: an increase in hardness from 226 HV25g to 1245 HV25g, and a considerably decrease in volume loss by wear effect.

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“…This is because the probability for collisions of electrons with atoms increases when passing through the hollow anode, and the intensive ionization and excitation of the atoms can be observed [5,6]. As a DC plasma source, it has the advantage of easy operation, low cost and high homogeneity [7]. However, analysis of plasma jets from the hollow-anode plasma is insufficient for material applications, and more practical data are needed in addition to previous research, due to the lack of measurements of plasma parameters and comparison with theory [5,6,8,9].…”

Section: Introductionmentioning

confidence: 99%

Investigation of Compact Hollow-Anode Discharge Source for Copper Thin Films by Sputtering Processes

et al. 2021

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A compact hollow-anode discharge (HAD) source with a size of 60 mm in radius and 70 mm in length has been developed to stably generate plasma jets for various sputtering processes in semiconductor and display fabrications. A developed HAD plasma source has been investigated by cylindrical electric probes, and the experimental results were compared to the values of numerical calculations. A uniform density discharge model with a geometry factor was proposed to estimate the profiles of plasma parameters. Owing to the difference of absolute magnitude, even with the similar trend of spatial variation, plasma parameters such as electron temperature (Te) and plasma density (ne) measured at z = 3 cm have been calibrated by the values of numerical calculations at the nozzle entrance (z = 0 cm, at the throat of the jet), and the calibration factors for Te and n0 have been deduced by comparing the experimental values to numerical calculations. These are to be explained by the decay mechanism along the axis of the jet with elastic collisions in terms of the mean free path. The developed HAD plasma source was tested for the deposition of Cu thin films with an optimized condition as a plausible application to sputtering processes.

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V-I curves and plasma parameters in a high density DC glow discharge generated by a current-source

Cited by 8 publications

References 10 publications

Effect of hydrogen ratio on plasma parameters of N2-H2 gas mixture glow discharge

Effect of hydrogen ratio on plasma parameters of N2-H2 gas mixture glow discharge

Effect of Nitriding Current Density on the Surface Properties and Crystallite Size of Pulsed Plasma-Nitrided AISI 316L

Investigation of Compact Hollow-Anode Discharge Source for Copper Thin Films by Sputtering Processes

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