UV nanoimprint lithography with rigid polymer molds

Gilles, Sandra; Meier, Matthias; Prömpers, Michael; Hart, A. van der; Kügeler, C.; Offenhäusser, Andreas; Mayer, Dirk

doi:10.1016/j.mee.2008.12.051

Cited by 50 publications

(38 citation statements)

References 7 publications

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“…Several reports point out the fabrication of the PDMS mold as the limiting factor to high fidelity replication; either its high viscosity [12] or its easy deformability [13] seems to be an important drawback for an optimum sub-micron resolution. However, different approaches in the intermediate mold fabrication lead to resolutions around 50 nm, which have been achieved by working with more favorable master textures consisting of periodical arrangements of dots [12] and square shaped pillars [14].…”

Section: Introductionmentioning

confidence: 99%

High fidelity transfer of nanometric random textures by UV embossing for thin film solar cells applications

Escarré

Söderström

Battaglia

et al. 2011

Solar Energy Materials and Solar Cells

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a b s t r a c tWe investigate the transfer of random nanostructures commonly used in thin film silicon solar cells onto inexpensive substrates, such as glass or flexible polyethylene sheets. Morphological and optical analyses of masters and replicas show the successful transfer of details with sizes much below 1 mm. These highquality replicas are obtained by UV nano-imprinting, avoiding the use of PDMS as an intermediate mold, which has been identified as being responsible for the lack of resolution found in previous works.

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Section: Introductionmentioning

confidence: 99%

High fidelity transfer of nanometric random textures by UV embossing for thin film solar cells applications

Escarré

Söderström

Battaglia

et al. 2011

Solar Energy Materials and Solar Cells

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“…There are some publications showing impressive imprint results using ETFE as a stamp material [147,166,209]. One big advantage for this stamp material is the intrinsic anti-sticking behaviour of this Teflon-like fluoropolymer.…”

Section: Stamp Fabricationmentioning

confidence: 99%

“…This material is commercially available as a foil material e.g. by DuPont or Asahi Glass Company and values for the Young`s modulus can be found in the literature that are in the range of 190 MPa to 1 GPa [147,209]. The patterning again takes place in a hot embossing process.…”

Section: Stamp Fabricationmentioning

confidence: 99%

Nanoimprint lithography for solar cell texturisation

et al. 2010

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The highest efficiency silicon solar cells are fabricated using defined texturing schemes by applying etching masks. However, for an industrial production of solar cells the usage of photolithographic processes to pattern these etching masks is too consumptive. Especially for multicrystalline silicon, there is a huge difference in the quality of the texture realized in high efficiency laboratory scale and maskless industrial scale fabrication. In this work we are describing the topography of a desired texture for solar cell front surfaces. We are investigating UV-nanoimprint lithography (UV-NIL) as a potential technology to substitute photolithography and so to enable the benefits resulting of a defined texture in industrially feasible processes. Besides the reduced process complexity, UV-NIL offers new possibilities in terms of structure shape and resolution of the generated etching mask. As mastering technology for the stamps we need in the UV-NIL, interference lithography is used. The UV-NIL process is conducted using flexible UV-transparent stamps to allow a full wafer process. The following texturisation process is realized via crystal orientation independent plasma etching to tap the full potential of the presented process chain especially for multicrystalline silicon. The textured surfaces are characerised optically using fourier spectroscopy

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“…Hence, the mold is usually coated with an antisticking layer (ASL) to prevent the adhesion of resin and the replica mold is also required to reduce damage to the master mold. Recently, the polymer molds have been studying as the replica mold [4][5][6][7][8] . Hydrogen silsesquioxane (HSQ) is one of spin-on-glasses (SOGs) and is also one of promising replica mold materials because HSQ has high hardness, thermal stability and transparence.…”

Section: Introductionmentioning

confidence: 99%