UV LED lithography with digitally tunable exposure dose

Yapıcı, Murat Kaya; Farhat, Ilyas A. H.

doi:10.1117/1.jmm.13.4.043004

J. Micro/Nanolith. MEMS MOEMS

2014

DOI: 10.1117/1.jmm.13.4.043004

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UV LED lithography with digitally tunable exposure dose

Murat Kaya Yapıcı

Ilyas A. H. Farhat

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Cited by 3 publications

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“…Although commercial mask aligners provide uniform intensity, a UV-LED-based light source has also been developed because of its low cost, low power consumption, simple structure, long lifespan, and compact size. [4][5][6][7][8] Also, in UV-LEDs, it is easy to control light emission compared with the mercury lamp of mask aligners. To utilize UV-LEDs in MEMS fabrication, UV light rays must be collimated, and it is necessary to ensure that these rays have a uniform intensity in the irradiated area.…”

mentioning

confidence: 99%

Development of a light source with a uniform intensity reinforced by a checkerboard half-mirror positioned within inverse L-shaped UV-LED arrays

Takahashi

Heo

2018

Appl. Phys. Express

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This paper presents a simple, low-cost, long-lasting UV-LED-based light source with uniform light intensity using a checkerboard half-mirror positioned within inverse L-shaped UV-LED arrays. The light rays from the top UV-LED array passed through the transparent portions of the checkerboard half-mirror, while the light rays from the side UV-LED array were reflected on the remaining opaque portions at right angles. Thus, uniform light intensity was achieved on the bottom area. Using the developed UV-LED light source, we fabricated microstructures with uniform shapes on a large area, thereby showing feasible applications for MEMS fabrication.

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mentioning

confidence: 99%

Development of a light source with a uniform intensity reinforced by a checkerboard half-mirror positioned within inverse L-shaped UV-LED arrays

Takahashi

Heo

2018

Appl. Phys. Express

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Uniform areal-distribution of UV intensity by synchronizing signal-waveforms and position of a UV-LED array

Takahashi

Shimoyama

Heo

2017

Applied Physics Letters

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This paper describes a theoretical approach to give an irradiated area a uniform distribution of LED light intensity by synchronizing the signal waveforms and position control of the LEDs. Although UV-LEDs have attracted considerable attention as alternative light sources for ultraviolet (UV) lithography in Micro Electro Mechanical Systems (MEMS) fabrication, mainly because of their low cost and low power consumption, the realization of a uniform UV intensity over an area remains challenging. Here, we propose a method to achieve a uniform areal intensity within an irradiated area by synchronizing the signal waveform and position of a UV-LED array. To verify our theoretical calculation, we developed a system with a UV-LED array whose position is controlled by a linear actuator. The intensity of the UV-LED array is controlled by a pulse width modulation (PWM) signal, which is synchronized with the position of the linear actuator. Using this system, we fabricated 2D micropatterns and 3D microstructures with high uniformity in the irradiated area. The proposed method is expected to facilitate practical LED-based lithography in MEMS fabrication.

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Developments in Mask-Free Singularly Addressable Nano-LED Lithography

Mikulics,

Winden,

Mayer

et al. 2024

Nanomanufacturing

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LED devices are increasingly gaining importance in lithography approaches due to the fact that they can be used flexibly for mask-less patterning. In this study, we briefly report on developments in mask-free lithography approaches based on nano-LED devices and summarize our current achievements in the different building blocks needed for its application. Individually addressable nano-LED structures can form the basis for an unprecedented fast and flexible patterning, on demand, in photo-chemically sensitive films. We introduce a driving scheme for nano-LEDs in arrays serving for a singularly addressable approach. Furthermore, we discuss the challenges facing nano-LED fabrication and possibilities to improve their performance. Additionally, we introduce LED structures based on a hybrid nanocrystal/nano-LED approach. Lastly, we provide an outlook how this approach could further develop for next generation lithography systems. This technique has a huge potential to revolutionize the field and to contribute significantly to energy and resources saving device nanomanufacturing.

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UV LED lithography with digitally tunable exposure dose

Cited by 3 publications

References 14 publications

Development of a light source with a uniform intensity reinforced by a checkerboard half-mirror positioned within inverse L-shaped UV-LED arrays

Development of a light source with a uniform intensity reinforced by a checkerboard half-mirror positioned within inverse L-shaped UV-LED arrays

Uniform areal-distribution of UV intensity by synchronizing signal-waveforms and position of a UV-LED array

Developments in Mask-Free Singularly Addressable Nano-LED Lithography

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