1999
DOI: 10.1002/(sici)1099-0739(199909)13:9<643::aid-aoc886>3.0.co;2-#
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UV‐laser‐induced photolysis of trimethyl(vinyloxy)silane for chemical vapour deposition of polysiloxane films

Abstract: The UV‐induced photolysis of trimethyl(vinyloxy)silane (TMVSi) induced by ArF laser, affording a multitude of unsaturated hydrocarbons and a solid polydimethylsiloxane, represents a convenient process of chemical vapour deposition in which the silicon of the parent is almost completely utilized for the formation of the solid phase and in which the morphology and composition of the films is affected by the configuration of the substrate and laser beam. Copyright © 1999 John Wiley & Sons, Ltd.

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Cited by 9 publications
(10 citation statements)
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“…620 kJ mol 21 and is in excess of the energy required to split the Si-C (y370 kJ mol 21 ), C-H (y410 kJ mol 21 ) and Si-H (y380 kJ mol 21 ) and even of the strong Si-O bond (y530 kJ mol 21 ). 27 However, the Si-O bond cleavage is not a feasible photochemical step 28,29 and the expected primary photolytic processes are 1,1-H 2 and 1,1-[hydrocarbon] eliminations. 16,30,31 The predominance of ethane among the hydrocarbons indicates that ethane originates via molecular extrusion.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…620 kJ mol 21 and is in excess of the energy required to split the Si-C (y370 kJ mol 21 ), C-H (y410 kJ mol 21 ) and Si-H (y380 kJ mol 21 ) and even of the strong Si-O bond (y530 kJ mol 21 ). 27 However, the Si-O bond cleavage is not a feasible photochemical step 28,29 and the expected primary photolytic processes are 1,1-H 2 and 1,1-[hydrocarbon] eliminations. 16,30,31 The predominance of ethane among the hydrocarbons indicates that ethane originates via molecular extrusion.…”
Section: Resultsmentioning
confidence: 99%
“…Comment on the fragmentation of DEDSO and ethyldisiloxane under electron impact is pertinent. The mass spectra of DEDSO [m/z (relative intensity, %)~134 (10), 133 (41), 132 (29), 106 (13), 105 (92), 104 (20), 103 (22), 78 (16), 77 (100), 76 (14), 75 (50), 74 (11), 73 (17), 72 (7)] and of ethyldisiloxane [m/z (relative intensity, %)~106 (11), 105 (60), 104 (10), 78 (12), 77 (100), 76 (30), 75 (48), 74 (9), 73 (17), 72 (8)] consist of signals corresponding to the loss of ethene and of 1-5 or 1-6 H atoms. Both mass spectra were obtained by GC/MS analysis.…”
Section: Resultsmentioning
confidence: 99%
“…In this study, we report on gas‐phase assisted surface polymerization (GASP) behavior of β PL and the unique properties of the PPL/substrate composites obtained. Many reports about GASP on solid surfaces have been published, for example chemical vapor deposition,23–30 gas‐phase photo‐induced polymerization,31–36 laser‐generated gas‐phase polymerization,37–39 and plasma polymerization 40–42. However, no report on GASP of β PL has so far been published.…”
Section: Introductionmentioning
confidence: 99%
“…These features allow one to suggest that incorporation of oxygen in the deposit occurs via insertion 3,4 of silylene into ROH and subsequent feasible 38,44 cleavage of alkoxysilane at the OÐC bond, as depicted in Scheme 4.…”
Section: Photolysis Of Scp In the Presence Of Ch 3 Oh CD 3 Oh F 3 Cmentioning
confidence: 99%