UV Laser‐Induced Gas‐Phase Copolymerization of Carbon Disulfide and Ethene

Abstract

Summary: The laser irradiation at 193 nm of a gaseous mixture of carbon disulfide and ethene induces the copolymerization of both compounds and affords the chemical vapour deposition of a C/S/H polymer, the composition of which indicates the reaction between two to three CS2 molecules and one C2H4 molecule. Polymer structure is interpreted on the basis of X‐ray photoelectron and FT‐IR spectra as consisting of >CS, >CC<, CH2CH2, (CC)SnC4 − n, C(CS)S, S(CS)S, and CSSC configurations. The gas‐phase copolymerization of carbon disulfide and ethene represents the first example of such a reaction between carbon disulfide and a common monomer.

UV Laser Deposition of SiS/Poly(thiacarbosilane) Composites and their Conversion to SiO/Poly(thiacarbosiloxane) Composites

“…The former route implies formation of elemental sulfur and polythiene [6] and the latter is in line with the formation of a (CS 2 ) n polymer (e.g. [8,9,23,24] [25,26] ) and decomposition of silylene (producing H 2 and H/Si agglomerates) together with reaction of silylene with CS 2 [27] and transient formation of silanethione [28] are other plausible reactions.…”

“…We have previously shown that laser-induced codecomposition of metal and chalcogene progenitors, leading to gas-phase formation of metal and chalcogene clusters, is suitable for chemical vapor deposition of nanosized metal chalcogenides. [10,[18][19][20] Continuing our studies on laserinduced chemical vapor deposition of polythiene [6] and CS 2 /C 2 H 4 co-polymer, [8,9] we now report on ArF laser irradiation of gaseous carbon disulfide-silane mixtures and show that this process affords chemical vapor deposition of SiS-containing poly(thiacarbosilane)s. These materials are the first example of SiS/polymer composites.…”

UV Laser Chemical Vapor Deposition of Nano‐Chained Copolymer from Carbon Disulfide and Ethene

“…(We note that an efficient sulfur removal by the solvent from the polymer deposited through ArF laser irradiation of CS 2 alone was ascribed to the presence of elemental sulfur incorporated but not bonded in the polymer framework). [14] XP Spectra…”

“…[14] Relative depletion of both educts is not apparently affected by the initial CS 2 /C 2 H 4 ratio (5-0.2) and CS 2 depletes at least twice more efficiently than ethene.…”

“…We have recently revealed [14] that ArF laser irradiation of a gaseous mixture of carbon disulfide and ethene induced copolymerization of both molecules and afforded chemical vapor deposition of a C/S/H polymer consisting of >C S, >C C<, -CH 2 -CH 2 -, (C C)S n C 4Àn , -C-(C S)-S-, -S-(C S)-S-and C-S-S-C configurations. This process differs from the earlier reported copolymerization of carbon disulfide and methyl acrylate or acrolein using irradiation at 337 nm, [15,16] both of which represent the separate polymerization of each educt and the production of aerosol particles consisting of the block copolymers.…”