UV-Based Advanced Oxidation Processes for Antibiotic Resistance Control: Efficiency, Influencing Factors, and Energy Consumption

Han, Jiarui; Li, Wanxin; Yang, Yun; Zhang, Xuanwei; Bao, Siyu; Zhang, Xiangru; Zhang, Tong; Mei Yee Leung, Kenneth

doi:10.1016/j.eng.2023.09.021

Cited by 2 publications

(1 citation statement)

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“…The effective eradication of ARB and ARGs from diverse contaminated water matrices is now a focal point, surpassing the attention given to typical microbial contaminants. This is primarily attributed to the potential exacerbation of resistance contamination through the vertical gene transfer (VGT) and horizontal gene transfer (HGT) processes. , Considering these issues, advanced oxidation processes (AOPs) have been extensively researched for ARB and ARGs removal in recent years . Among the various methods available, sulfate anion radical (SO 4 •– )-based AOPs have garnered considerable attention.…”

Section: Introductionmentioning

confidence: 99%

Evaluating the Impact of Cl₂^•– Generation on Antibiotic-Resistance Contamination Removal via UV/Peroxydisulfate

Yang,

He,

Fan

et al. 2024

Environ. Sci. Technol.

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The removal of antibiotic-resistant bacteria (ARB) and antibiotic-resistance genes (ARGs) using sulfate anion radical (SO 4•− )-based advanced oxidation processes has gained considerable attention recently. However, immense uncertainties persist in technology transfer. Particularly, the impact of dichlorine radical (Cl 2•− ) generation during SO 4•− -mediated disinfection on ARB/ ARGs removal remains unclear, despite the Cl 2•− concentration reaching levels notably higher than those of SO 4•− in certain SO 4•− -based procedures applied to secondary effluents, hospital wastewaters, and marine waters. The experimental results of this study reveal a detrimental effect on the disinfection efficiency of tetracycline-resistant Escherichia coli (Tc-ARB) during SO 4•−mediated treatment owing to Cl 2•− generation. Through a comparative investigation of the distinct inactivation mechanisms of Tc-ARB in the Cl 2•− -and SO 4•− -mediated disinfection processes, encompassing various perspectives, we confirm that Cl 2•− is less effective in inducing cellular structural damage, perturbing cellular metabolic activity, disrupting antioxidant enzyme system, damaging genetic material, and inducing the viable but nonculturable state. Consequently, this diminishes the disinfection efficiency of SO 4•− -mediated treatment owing to Cl 2•− generation. Importantly, the results indicate that Cl 2•− generation increases the potential risk associated with the dark reactivation of Tc-ARB and the vertical gene transfer process of tetracycline-resistant genes following SO 4•− -mediated disinfection. This study underscores the undesired role of Cl 2•− for ARB/ARGs removal during the SO 4•− -mediated disinfection process.

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Section: Introductionmentioning

confidence: 99%

Evaluating the Impact of Cl₂^•– Generation on Antibiotic-Resistance Contamination Removal via UV/Peroxydisulfate

Yang,

He,

Fan

et al. 2024

Environ. Sci. Technol.

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A review on the alternatives to antibiotics and the treatment of antibiotic pollution: Current development and future prospects

Yang,

Li,

Yao

et al. 2024

Science of The Total Environment

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UV-Based Advanced Oxidation Processes for Antibiotic Resistance Control: Efficiency, Influencing Factors, and Energy Consumption

Cited by 2 publications

References 131 publications

Evaluating the Impact of Cl₂^•– Generation on Antibiotic-Resistance Contamination Removal via UV/Peroxydisulfate

Evaluating the Impact of Cl₂^•– Generation on Antibiotic-Resistance Contamination Removal via UV/Peroxydisulfate

A review on the alternatives to antibiotics and the treatment of antibiotic pollution: Current development and future prospects

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UV-Based Advanced Oxidation Processes for Antibiotic Resistance Control: Efficiency, Influencing Factors, and Energy Consumption

Cited by 2 publications

References 131 publications

Evaluating the Impact of Cl2•– Generation on Antibiotic-Resistance Contamination Removal via UV/Peroxydisulfate

Evaluating the Impact of Cl2•– Generation on Antibiotic-Resistance Contamination Removal via UV/Peroxydisulfate

A review on the alternatives to antibiotics and the treatment of antibiotic pollution: Current development and future prospects

Contact Info

Product

Resources

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Evaluating the Impact of Cl₂^•– Generation on Antibiotic-Resistance Contamination Removal via UV/Peroxydisulfate

Evaluating the Impact of Cl₂^•– Generation on Antibiotic-Resistance Contamination Removal via UV/Peroxydisulfate