Evaluating the Impact of Cl2•– Generation on Antibiotic-Resistance Contamination Removal via UV/Peroxydisulfate
Hao Yang,
Dongyang He,
Linyi Fan
et al.
Abstract:The removal of antibiotic-resistant bacteria (ARB) and antibiotic-resistance genes (ARGs) using sulfate anion radical (SO 4•− )-based advanced oxidation processes has gained considerable attention recently. However, immense uncertainties persist in technology transfer. Particularly, the impact of dichlorine radical (Cl 2•− ) generation during SO 4•− -mediated disinfection on ARB/ ARGs removal remains unclear, despite the Cl 2•− concentration reaching levels notably higher than those of SO 4•− in certain SO 4•−… Show more
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