2021
DOI: 10.1016/j.ceramint.2021.08.342
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UV-assisted safe etching route for the synthesis of Mo2CTx MXene from Mo–In–C non-MAX phase

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Cited by 25 publications
(12 citation statements)
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“…After the introduction of vacancy, it can be found that Mo 3d, P 2p, and Ru 3p in the Ru-Mo-P V shift to low binding energies (Figure b–d) due to Mo and Ru valences decreasing after NaBH 4 treatment, and the P can achieve more electrons. For Mo 3d in Ru-MoP-P V (Figure b), the peaks at 228.2, 230.9, 231.4, and 234.5 eV are attributed to Mo δ+ (0< δ < 4) species of MoP. The characteristic peaks at 232.9 eV and 236.3 eV are attributed to Mo 6+ due to the slight oxidation of MoP in the air. , For P 2p, the peaks at around 129.5 eV/130.4 eV are assigned to the Mo–P bond, , and the peak of P–O is located at 133.6 eV (Figure c). For Ru 3p, the peaks at 461.4 and 483.7 eV are assigned to Ru (0) , (Figure d).…”
Section: Resultsmentioning
confidence: 99%
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“…After the introduction of vacancy, it can be found that Mo 3d, P 2p, and Ru 3p in the Ru-Mo-P V shift to low binding energies (Figure b–d) due to Mo and Ru valences decreasing after NaBH 4 treatment, and the P can achieve more electrons. For Mo 3d in Ru-MoP-P V (Figure b), the peaks at 228.2, 230.9, 231.4, and 234.5 eV are attributed to Mo δ+ (0< δ < 4) species of MoP. The characteristic peaks at 232.9 eV and 236.3 eV are attributed to Mo 6+ due to the slight oxidation of MoP in the air. , For P 2p, the peaks at around 129.5 eV/130.4 eV are assigned to the Mo–P bond, , and the peak of P–O is located at 133.6 eV (Figure c). For Ru 3p, the peaks at 461.4 and 483.7 eV are assigned to Ru (0) , (Figure d).…”
Section: Resultsmentioning
confidence: 99%
“…56−59 The characteristic peaks at 232.9 eV and 236.3 eV are attributed to Mo 6+ due to the slight oxidation of MoP in the air. 60,61 For P 2p, the peaks at around 129.5 eV/130.4 eV are assigned to the Mo−P bond, 62,63 and the peak of P−O is located at 133.6 eV 64 (Figure 2c). For Ru 3p, the peaks at 461.4 and 483.7 eV are assigned to Ru (0) 65,66 (Figure 2d).…”
Section: Resultsmentioning
confidence: 99%
“…The as synthesized MXene has a lamellar microstructure and comparable XRD peaks with HF-etched MXene. The reaction follows the following chemistry: where A can be Si or Ge, n = 2-4 and m = 3-4) using UV etching [122]. This selective etching technique using concentrated phosphoric acid to obtain Mo 2 CT x after 3-4 h of UV exposure caused lattice rearrangements and oxidation of Mo 2+ species.…”
Section: Processing Techniques For Green Synthesismentioning
confidence: 99%
“…The instinct is that the non-MAX phase materials like MoInC or Mo 2 Ga 2 C result in the synthesis of Mo 2 CT x (MXenes), which exhibits a similar structure produced from the MAX phase precursor like Mo 2 GaC. [22][23][24][25] Hence, it is not astonishing that the same kind of MXene can be produced from different optimal precursors. Similarly, the combined structure of quaternary materials in the general formula of MAX Phase (M n+1 AX n ), with the combination of pure or mixture of M, A, and X sublattices, are called i-MAX precursors.…”
Section: Synthesis and Properties Of Mxenementioning
confidence: 99%