1999
DOI: 10.1016/s1359-6454(99)00262-1
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Use of novel methods for the investigation of the boron distribution in CVD diamond

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Cited by 35 publications
(11 citation statements)
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“…It may be introduced into the material during deposition and a wide range of boron concentrations have been achieved, up to a few percent. However, the amount incorporated depends on the particular growth sector. For the case of polycrystalline diamond films obtained by chemical vapor deposition (CVD) techniques, there are a number of papers describing the spatially inhomogeneous distribution of boron. For example, the dopant concentration in the 〈111〉 growth sector is approximately 1 order of magnitude higher than that in the 〈100〉 sector. , It may be also supposed that boron can aggregate in the grain boundaries of polycrystalline films, and in such a case, these dopant atoms will not function electronically in terms of providing charge carriers.…”
Section: Introductionmentioning
confidence: 99%
“…It may be introduced into the material during deposition and a wide range of boron concentrations have been achieved, up to a few percent. However, the amount incorporated depends on the particular growth sector. For the case of polycrystalline diamond films obtained by chemical vapor deposition (CVD) techniques, there are a number of papers describing the spatially inhomogeneous distribution of boron. For example, the dopant concentration in the 〈111〉 growth sector is approximately 1 order of magnitude higher than that in the 〈100〉 sector. , It may be also supposed that boron can aggregate in the grain boundaries of polycrystalline films, and in such a case, these dopant atoms will not function electronically in terms of providing charge carriers.…”
Section: Introductionmentioning
confidence: 99%
“…B offers more of a challenge since B-doped diamond is only weakly luminescent and is associated with a broad green luminescence band (Collins et al, 1990) We have now established several new ways to study the level of B incorporation into CVD diamond. One of these involves the use of an in-house constructed liquid Ga source magnetic sector secondary ion microscope (Steeds et al, 1999c). For samples with B concentrations ∼10 20 cm −3 , B ion images show the variation of B from one region to another very clearly: variations of up to a factor of 8 in B concentration are illustrated in Figure 7.…”
Section: Dopant and Impurity Distributionsmentioning
confidence: 99%
“…At B concentrations of about 10 19 cm −3 and above the form of the Raman longitudinal-optic phonon line-profiles change because of a Fano resonance between the electronic and phonon states. This effect may also be used to map out the local changes of B concentration (Steeds et al, 1999c). Now it also seems likely that sharp ZPLs induced in B-doped samples by electron irradiation may also be used for this purpose.…”
Section: Dopant and Impurity Distributionsmentioning
confidence: 99%
“…Changes of the Fano profile can be used to measure the local doping level and map out changes of boron concentration. Alternatively, SIMS is also a technique sensitive to small B concentrations and so the same task can be performed by B SIMS images [5].…”
Section: Point Defect and Dopant Distributionsmentioning
confidence: 99%