2022
DOI: 10.1149/1945-7111/ac78d3
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Use of Multielectrode Arrays and Statistical Analysis to Investigate the Pitting Probability of Copper. Part I: The Effect of Chloride

Abstract: Under some conditions, copper and copper alloys are either immune from corrosion or undergo slow uniform corrosion, generally considered a favourable situation, because predicting the damage incurred by the metal during a period of uniform corrosion is relatively straightforward. However, under conditions leading to surface passivation of Cu, localized corrosion might occur in the presence of aggressive oxidants. Therefore, the susceptibility of Cu to localized corrosion must be considered carefully to avoid u… Show more

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Cited by 3 publications
(13 citation statements)
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“…Many studies have been performed to investigate the pitting of Cu in a range of environments, with corrosion parameters considered to be deterministic, not distributed 18,22,26,27,29,31,54,[65][66][67] . However, we showed the stochastic nature of corrosion parameters in our previous papers 73 . Here, we investigate the pitting probability, passive film morphology, and composition of oxide films in solutions with different chloride concentrations, using electrochemical, surface analysis, and statistical techniques to determine the pitting mechanism of Cu.…”
Section: Introductionmentioning
confidence: 70%
See 1 more Smart Citation
“…Many studies have been performed to investigate the pitting of Cu in a range of environments, with corrosion parameters considered to be deterministic, not distributed 18,22,26,27,29,31,54,[65][66][67] . However, we showed the stochastic nature of corrosion parameters in our previous papers 73 . Here, we investigate the pitting probability, passive film morphology, and composition of oxide films in solutions with different chloride concentrations, using electrochemical, surface analysis, and statistical techniques to determine the pitting mechanism of Cu.…”
Section: Introductionmentioning
confidence: 70%
“…Histograms of Ecorr and Eb determined under passive conditions were plotted to facilitate the selection of applied potentials to be used in potentiostatic experiments. The applied potentials for potentiostatic experiments were chosen to be a) the maximum observed Ecorr value + 20 mV and b) the minimum observed Eb value -20 m V. These values were chosen to cover the tails of the Ecorr and Eb distribution curves where there are concerns about the pitting probability 73 . Eb was identified as the potential at which the current abruptly increased, and was determined from the intersection of the tangent to the current in the passive range and the rising current in the potential range after breakdown 69,74 .…”
Section: Multielectrode Arraysmentioning
confidence: 99%
“…[17] The use of multielectrode arrays using a multichannel microelectrode analyzer has also been demonstrated for copper pitting probability studies in chloride media. [18] From the current state-of-the-art review presented here, and the majority of recent research, [19,20] it is clear that several issues remain unanswered.…”
Section: Introductionmentioning
confidence: 93%
“…[ 17 ] The use of multielectrode arrays using a multichannel microelectrode analyzer has also been demonstrated for copper pitting probability studies in chloride media. [ 18 ]…”
Section: Introductionmentioning
confidence: 99%
“…9,10,63,68 The corrosion behaviour of Cu in different environments, such as seawater and deaerated solutions, is well established. In addition, Matin et al 69 investigated the pitting probability of Cu in chloridecontaining solutions using multielectrode arrays and statistical analysis, but there is a lack of information regarding the susceptibility of Cu to pitting corrosion in sulfate-containing solutions. The majority of the published research has been conducted based on the hypothesis that corrosion parameters are deterministic, thus ignoring the effect of distributed values.…”
mentioning
confidence: 99%