Upgrading the “Berg-model” for reactive sputtering processes

Berg, Sören; Särhammar, Erik; Nyberg, Tomas

doi:10.1016/j.tsf.2014.02.063

Cited by 83 publications

(68 citation statements)

References 12 publications

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“…this commonly reported behavior is associated with the oxidation and reduction of the sputter target surface as reactive gas content is varied [55][56][57][60][61][62]. At Q O2 values near 5 sccm and above, P O2 increases linearly at a rate proportional to the pumping speed of the system.…”

Section: Accepted Manuscriptmentioning

confidence: 90%

“…MPPMS was used due to its ability to generate high target power densities, allowing for rapid reduction of oxygen on the surface of the "oxygen poisoned" molybdenum cathode, as well as for its highly metallic plasma resulting in increased oxygengettering capability [50][51][52][53]. Therefore, fine adjustments in the applied MPPMS power should be able to accurately control the oxygen partial pressure within the deposition chamber via chemisorption [50,[54][55][56][57].…”

Section: Introductionmentioning

confidence: 99%

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Hybrid co-deposition of mixed-valent molybdenum–germanium oxides (MoxGeyOz): A route to tunable optical transmission

et al. 2015

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Section: Accepted Manuscriptmentioning

confidence: 90%

Section: Introductionmentioning

confidence: 99%

Hybrid co-deposition of mixed-valent molybdenum–germanium oxides (MoxGeyOz): A route to tunable optical transmission

et al. 2015

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“…Simulations and modelling of the reactive sputtering deposition processes using two reactive gases have shown that the deposition process response is unlike that one found when only one reactive gas is used [20]. Both reactive gases compete during compound formation, both on the target and on the substrate, which implies that both reactive gases contribute to the target poisoning effect.…”

Section: Deposition Rate and Film Compositionmentioning

confidence: 95%

Properties of tantalum oxynitride thin films produced by magnetron sputtering: The influence of processing parameters

Cristea

Constantin

Crişan

et al. 2013

Vacuum

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a b s t r a c tThe main purpose of this work is to present and to interpret the change of structure and physical properties of tantalum oxynitride (TaN x O y ) thin films, produced by dc reactive magnetron sputtering, by varying the processing parameters. A set of TaN x O y films was prepared by varying the reactive gases flow rate, using a N 2 /O 2 gas mixture with a concentration ratio of 17:3. The different films, obtained by this process, exhibited significant differences. The obtained composition and the interpretation of X-ray diffraction results, shows that, depending on the partial pressure of the reactive gases, the films are: essentially dark grey metallic, when the atomic ratio (N þ O)/Ta < 0.1, evidencing a tetragonal b-Ta structure; grey-brownish, when 0.1 < (N þ O)/Ta < 1, exhibiting a face-centred cubic (fcc) TaN-like structure; and transparent oxide-type, when (N þ O)/Ta > 1, evidencing the existence of Ta 2 O 5 , but with an amorphous structure. These transparent films exhibit refractive indexes, in the visible region, always higher than 2.0.The wear resistance of the films is relatively good. The best behaviour was obtained for the films with (N þ O)/Ta z 0.5 and (N þ O)/Ta z 1.3.

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“…Part of the vapor is ionized and there is a high partial pressure of inert sputtering gas. While the reactive sputtering process is on a global level rather well understood [19,20], there is no theory available that describes (off-) stoichiometry, that is, the nitrogen-to-metal ratio N/M of the thin film.…”

Section: Contactmentioning

confidence: 99%

Unprecedented thermal stability of inherently metastable titanium aluminum nitride by point defect engineering

Baben

Hans

Primetzhofer

et al. 2016

Materials Research Letters

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Extreme cooling rates during physical vapor deposition (PVD) allow growth of metastable phases. However, we propose that reactive PVD processes can be described by a gas-solid paraequilibrium defining chemical composition and thus point defect concentration. We show that this notion allows for point defect engineering by controlling deposition conditions. As example we demonstrate that thermal stability of metastable (Ti,Al)N x , the industrial benchmark coating for wear protection, can be increased from 800°C to unprecedented 1200°C by minimizing the vacancy concentration. The thermodynamic approach formulated here opens a pathway for thermal stability engineering by point defects in reactively deposited thin films. IMPACT STATEMENTA novel thermodynamic methodology to predict stoichiometry of coatings is utilized to increase thermal stability of today's industrial benchmark hard coating TiAlN from 800°C to 1200°C by point defect engineering. ARTICLE HISTORY

show abstract

Upgrading the “Berg-model” for reactive sputtering processes

Cited by 83 publications

References 12 publications

Hybrid co-deposition of mixed-valent molybdenum–germanium oxides (MoxGeyOz): A route to tunable optical transmission

Hybrid co-deposition of mixed-valent molybdenum–germanium oxides (MoxGeyOz): A route to tunable optical transmission

Properties of tantalum oxynitride thin films produced by magnetron sputtering: The influence of processing parameters

Unprecedented thermal stability of inherently metastable titanium aluminum nitride by point defect engineering

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