Unusual Magnesium Crystalline Nanoblades Grown by Oblique Angle Vapor Deposition

Tang, Fu; Parker, Thomas C.; Hf, Li; Gc, Wang; Tm, Lu

doi:10.1166/jnn.2007.665

Cited by 50 publications

(35 citation statements)

References 5 publications

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“…1a, the surface of the as-deposited Mg film consists of piles of nanoflakes, overlapping with one another, while the cross-sectional SEM reveals a typical columnar structure [35] of Mg film with a mean height h 0 ≈ 3.70 m. The as-deposited OAD sample (Fig. 2a) shows a wellaligned nanoblade array structure [19,20] with a mean height h 0 ≈ 5.34 m, blade thickness t 0 ≈ 250 nm, and blade ridge width w 0 ≈ 600 nm (as defined by the illustration in Fig. 2a).…”

Section: Mg Film and Mg Nanoblades On Si Substratesmentioning

confidence: 93%

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The role of Mg2Si formation in the hydrogenation of Mg film and Mg nanoblade array on Si substrates

Zhao

2009

Journal of Alloys and Compounds

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Section: Mg Film and Mg Nanoblades On Si Substratesmentioning

confidence: 93%

“…It has been demonstrated that the structure of the nanoblades can be tailored by a geometric shadowing effect and doping [19,20]. This tunable nanoblade structure provides an excellent opportunity to study the hydrogen interacting with different intrinsic Mg nanostructures and incorporated nanocatalysts.…”

Section: Samplementioning

confidence: 99%

The role of Mg2Si formation in the hydrogenation of Mg film and Mg nanoblade array on Si substrates

Zhao

2009

Journal of Alloys and Compounds

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“…The most widely used approach to achieve this is the evaporation of material from a crucible through the impingement of electrons, although OAD thin films prepared by resistive evaporation under vacuum have also been reported [22][23][24][25][26]. Starting with this concept, Section 3 describes the different thin film processing techniques in which restrictions imposed by the deposition method or the presence of a gas in the chamber may alter the directionality of the particles being deposited.…”

Section: Structure Organization and Review Contentmentioning

confidence: 99%

“…The first scenario is typical of e-beam assisted evaporation, which is the most common experimental arrangement for the OAD of thin films. With the exception of a few thermal evaporation experiments [22][23][24][25][26], the second situation applies exclusively to MS and other deposition techniques that are performed in the presence of a certain gas pressure, a situation that is of relevance to the techniques and results reviewed in Section 3. These schemes highlight the geometrical parameters relevant to the OAD of thin films, namely the zenithal angle of alignment between the source and the film (a), the azimuthal angle (/) and the polar angles (d) and (h).…”

Section: Thin Film Deposition At Oblique Anglesmentioning

confidence: 99%

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Barranco

Borrás

González‐Elipe

et al. 2016

Progress in Materials Science

599

436

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a b s t r a c tThe oblique angle configuration has emerged as an invaluable tool for the deposition of nanostructured thin films. This review develops an up to date description of its principles, including the atomistic mechanisms governing film growth and nanostructuration possibilities, as well as a comprehensive description of the applications benefiting from its incorporation in actual devices. In contrast with other reviews on the subject, the electron beam assisted evaporation technique is analyzed along with other methods operating at oblique angles, including, among others, magnetron sputtering and pulsed laser or ion beam-assisted deposition techniques. To account for the existing differences between deposition in vacuum or in the presence of a plasma, mechanistic simulations are critically revised, discussing well-established paradigms such as the tangent or cosine rules, and proposing new models that explain the growth of tilted porous nanostructures. In the second part, we present an extensive description of applications wherein oblique-angle-deposited thin films are of relevance. From there, we proceed by considering the requirements of a large number of functional devices in which these films are currently being utilized (e.g., solar cells, Li batteries, electrochromic glasses, biomaterials, sensors, etc.), and subsequently describe how and why these nanostructured materials meet with these needs.

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“…The oblique incident flux breaks not only the azimuthal symmetry of the crystal orientation, but also the azimuthal symmetry of the morphology. Because of the broken symmetry, one expects the diffraction pattern to change as a function of azimuthal angle, as seen, for example, in slanted Ru nanorods (Tang et al 2006b) and Mg nanoblades (Tang et al 2007a). The 75…”

Section: Biaxial Texture Of Mg Nanobladesmentioning

confidence: 99%

RHEED Transmission Mode and RHEED Pole Figure

Wang

2013

RHEED Transmission Mode and Pole Figures

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In the last chapter, we presented the principles of x-ray diffraction and the construction of a pole figure, particularly the pole figure constructed from the diffraction patterns obtained by an area detector. In this chapter, we describe the similarities and differences between reflection high-energy electron diffraction (RHEED) transmission mode and x-ray diffraction. Detailed descriptions of the diffraction space characteristics of RHEED transmission for a variety of crystal textures are given. We discuss kinematic simulations of RHEED patterns and the construction of RHEED pole figures from RHEED patterns. The relationship between RHEED pole figures and the orientation distribution function of biaxial texture is presented with examples. X-Ray Diffraction vs RHEEDMost thin films grown by common deposition techniques such as physical vapor deposition or chemical vapor deposition are not single crystals. Single crystals are grown only under specific favorable conditions. A major technique used for texture structure characterization is the x-ray pole figure. The typical photon energy used in x-ray diffraction is 8,048 eV (Cu K α ), while tens of kiloelectron volt electrons are used for reflection high-energy electron diffraction (RHEED). Here we discuss the similarities and differences between x-ray diffraction and the RHEED transmission mode. Strength of scattering cross sectionThe scattering cross section for electrons in solids is orders of magnitude higher than that for x-rays. For example, the total elastic electron scattering from Mo at 10 keV incident electron energy is on the order of 10 −19 m 2 (Browning 1991). In the energy range of 1-100 keV, the cross-section scales as E −0.5 in the low-energy regime and E −1 and Z 1.33 in the high-energy regime, where E is in units of keV and Z is the atomic number of an atom. For 1 keV photon, the total photon cross section from Pb is on the order of 10 −22 m 2 (Hubbell et al. 1975). The stronger scattering cross section of electrons provides a stronger electron diffraction signal from ultrathin films and nanostructures.

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Unusual Magnesium Crystalline Nanoblades Grown by Oblique Angle Vapor Deposition

Cited by 50 publications

References 5 publications

The role of Mg2Si formation in the hydrogenation of Mg film and Mg nanoblade array on Si substrates

The role of Mg2Si formation in the hydrogenation of Mg film and Mg nanoblade array on Si substrates

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

RHEED Transmission Mode and RHEED Pole Figure

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