2021
DOI: 10.1016/j.watres.2021.117158
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Unravelling molecular transformation of dissolved effluent organic matter in UV/H2O2, UV/persulfate, and UV/chlorine processes based on FT-ICR-MS analysis

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Cited by 91 publications
(46 citation statements)
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“…Usually, under the conditions of transition metal ions (e.g., Co 2+ and Fe 2+ ), light, heat, ultrasound, PS, or PMS can be activated to produce (Ji et al 2016 ; Naim and Ghauch 2016 ; Wei et al 2017 ). UV-254nm irradiation, which has been widely used for sterilization and disinfection, is also a promising method that activates PS/PMS to generate sulfate radical efficiently (Lin et al 2020 ; Zhang et al 2021 ). Lin et al ( 2020 ) studied the degradation of organosilicon wastewater by UV-based advanced oxidation processes: UV/H 2 O 2 , UV/peroxydisulfate (PDS), and UV/peroxymonosulfate (PMS), and the results showed that UV/PDS achieved a higher COD removal (90.6%) than UV/PMS (80.8%) after a 240 min reaction time.…”
Section: Introductionmentioning
confidence: 99%
“…Usually, under the conditions of transition metal ions (e.g., Co 2+ and Fe 2+ ), light, heat, ultrasound, PS, or PMS can be activated to produce (Ji et al 2016 ; Naim and Ghauch 2016 ; Wei et al 2017 ). UV-254nm irradiation, which has been widely used for sterilization and disinfection, is also a promising method that activates PS/PMS to generate sulfate radical efficiently (Lin et al 2020 ; Zhang et al 2021 ). Lin et al ( 2020 ) studied the degradation of organosilicon wastewater by UV-based advanced oxidation processes: UV/H 2 O 2 , UV/peroxydisulfate (PDS), and UV/peroxymonosulfate (PMS), and the results showed that UV/PDS achieved a higher COD removal (90.6%) than UV/PMS (80.8%) after a 240 min reaction time.…”
Section: Introductionmentioning
confidence: 99%
“…By using the data in Figure 1, the kobs values of iopromide degradation during UV photolysis, UV/Cl2, and UV/PS can be calculated as 4.58 (± 0.02) × 10 −2 , 2.20 (± 0.01) × 10 −1 , and 6.08 (± 0.10) × 10 −2 min −1 , respectively. The kobs values for UV/Cl2 and UV/PS were greater than the value for UV irradiation alone due to the generation of •OH, •SO4 − , and RCS [24].…”
Section: Kinetics Of Iopromide Degradation During Uv Photolysis Uv/cl...mentioning
confidence: 74%
“…A UV/H 2 O 2 system was established using a low-pressure mercury lamp (254 nm, 28 W, Shanghai Jiguang Special Lighting Appliance Factory) in a quartz sleeve for the generation of only solution HO · . The details about the photoexcitation system have been described in previous reports …”
Section: Methodsmentioning
confidence: 99%
“…The details about the photoexcitation system have been described in previous reports. 21 The photoexcitation system using 0.05 mM Rose Bengal (RB) as the 1 O 2 photosensitizer was set up in a 1 L cylindrical quartz reactor with a fluorescent lamp (output 24 W, Philips Co.). 22 2.6.…”
Section: Generation Of Ho• and Singletmentioning
confidence: 99%