2020
DOI: 10.1109/tns.2019.2947866
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Unifying Concepts for Ion-Induced Leakage Current Degradation in Silicon Carbide Schottky Power Diodes

Abstract: Reed, R. A.; Schrimpf, R. D.; Alles, J. M.; Lauenstein, J. M.; Javanainen, A.; Raman, A.; Chakraborty, P. S. et al. (2020). Unifying Concepts for Ion-Induced LeakageAbstract-The onset of ion-induced reverse leakage current in SiC Schottky diodes is shown to depend on material properties, ion LET, and bias during irradiation, but not the voltage rating of the parts. This is demonstrated experimentally for devices from multiple manufacturers with voltage ratings from 600 V to 1700 V. Using a device with a higher… Show more

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Cited by 22 publications
(23 citation statements)
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“…There are two main observations in this work: first, while the results are comparable for both types of devices, the data may indicate marginally lower thresholds for the isotopic type at 7.7 MeV-cm 2 /mg and 14.5 MeV-cm 2 /mg; secondly, the threshold voltage for leakage current degradation appears to be slightly higher than previously published literature [16], [17].…”
Section: Discussionsupporting
confidence: 52%
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“…There are two main observations in this work: first, while the results are comparable for both types of devices, the data may indicate marginally lower thresholds for the isotopic type at 7.7 MeV-cm 2 /mg and 14.5 MeV-cm 2 /mg; secondly, the threshold voltage for leakage current degradation appears to be slightly higher than previously published literature [16], [17].…”
Section: Discussionsupporting
confidence: 52%
“…The trend is also slightly higher for the natural type at the lower LET values, expect maybe for the D3 device at around 6 MeVcm 2 /mg in [18]. If the work in [17] suggests an independence on voltage rating, n-drift layer thickness and doping level, the higher threshold measured for this work may suggest another cause.…”
Section: Discussionmentioning
confidence: 58%
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