Uniformity enhancement of incident dose on concave surface in plasma immersion ion implantation assisted by beam-line ion source

Zhu, Zongtao; Xia, Tian; Wang, Zhijian; Gong, Chao; Yang, Shilin; Fu, Ricky K.Y.; Chu, Paul K.

doi:10.1016/j.surfcoat.2011.08.023

Cited by 8 publications

(5 citation statements)

References 13 publications

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“…Also, one can se that the conformal condition of the plasma sheath and the target surface degrades by propagating the sheath. Moreover, in both cases, it can be concluded that at the convex corner the electric field is largest and the expansion of the sheath is fastest which confirms the results of [22,26,28,30]. However, in the collisional case the rate of sheath expansion is slower than that in the collisionless case, hence, for example, the conformality of the plasma sheath and the target surface remains for longer times.…”

Section: Numerical Results and Discussionsupporting

confidence: 77%

“…Also, we assume that at time t = 0, the entire simulation region is filled with stationary ions (i.e., the ion velocity v i = 0 everywhere). At time = + t 0 , the bias on the target is switched from φ = 0 to a negative bias φ w , drawing ions to the target [22][23][24]. (As a first step in developing this model, we assume a zero-rise-time pulse, though in the real experiments this is not usually the case).…”

Section: Model and Theorymentioning

confidence: 99%

“…In the present paper, we extended the model introduced in [22] to include the ion-neutral collision and study the ion dynamics in a collisional pulsed plasma sheath for a target with a rectangular trench. The fact that the majority of industrial items, such as pistons, barrels, etc, have irregular surfaces with trenches or corrugations motivates us to this study.…”

Section: Introductionmentioning

confidence: 99%

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Dynamics of the collisional sheath around a planar target with a trench

Hatami¹,

Shokri²

2014

Phys. Scr.

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Using a two-dimensional collisional fluid model, the dynamics of the collisional sheath is investigated when a zero-rise-time negative voltage pulse is applied to a planar target with a rectangular trench immersed in the plasma. In this investigation, the temporal evolution of the sheath edge, ion velocity, density distribution, incidence angle and ion flux along the trench surfaces (sidewall and bottom) are studied numerically for different degrees of ion collisionality during the time. The results obtained show that ion-neutral collisions affect the spatial distribution of the ion flux, ion velocity and, hence, ion impact energy on the surfaces of the trench differently (e.g., they cause the profiles of ion flux and ion velocity along the sidewall and bottom of the trench to be nonmonotonic and monotonic, respectively). Moreover, ion-neutral collisions cause the magnitude of the ion impact energy and the ion flux along the bottom and sidewall of the trench to decrease. Furthermore, ion-neutral collisions weaken the dependence of the ion velocity along the trench surfaces on time. In addition, it is shown that ion-neutral collisions maintain the deviation of the sheath edge from the straight line for long time and decrease the incidence angle of the ions on the trench surfaces. Moreover, we show that the incidence angle of the ions decreases in the presence of collisions and, regardless of neutral gas pressure, this angle is more oblique near the corners of the trench. Additionally, it is shown that the ion density increases near the convex corner of the trench in both collisional and collisionless sheaths. Also, it is found that the sheath expansion near the convex corner is slower than that in the concave corner.

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Section: Numerical Results and Discussionsupporting

confidence: 77%

Section: Model and Theorymentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Dynamics of the collisional sheath around a planar target with a trench

Hatami¹,

Shokri²

2014

Phys. Scr.

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“…The nanoscale modified layer treated by ion implantation was determined by the implantation energy, dose and dose rate. Previous studies have revealed that the nanoscale modified layer differs from the bulk particles due to its unique physical and chemical properties [39][40][41]. In order to obtain a satisfied nanoscale modified layer, a high implantation dose range from 10 17 to 10 19 /cm 2 is required during implantation process [42][43][44][45].…”

Section: Introductionmentioning

confidence: 99%

Understanding the Microstructure Evolution of 8Cr4Mo4V Steel under High-Dose-Rate Ion Implantation

Miao,

Zhang,

Guo

et al. 2023

Materials

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In this study, the effect of microstructure under various dose rates of plasma immersion ion implantation on 8Cr4Mo4V steel has been investigated for crystallite size, lattice strain and dislocation density. The phase composition and structure parameters including crystallite size, dislocation density and lattice strain have been investigated by X-ray diffraction (XRD) measurements and determined from Scherrer’s equation and three different Williamson–Hall (W-H) methods. The obtained results reveal that a refined crystallite size, enlarged microstrain and increased dislocation density can be obtained for the 8Cr4Mo4V steel treated by different dose rates of ion implantation. Compared to the crystallite size (15.95 nm), microstrain (5.69 × 10−3) and dislocation density (8.48 × 1015) of the dose rate of 2.60 × 1017 ions/cm2·h, the finest grain size, the largest microstrain and the highest dislocation density of implanted samples can be achieved when the dose rate rises to 5.18 × 1017 ions/cm2·h, the effect of refining is 26.13%, and the increment of microstrain and dislocation density are 26.3% and 45.6%, respectively. Moreover, the Williamson–Hall plots are fitted linearly by taking βcosθ along the y-axis and 4sinθ or 4sinθ/Yhkl or 4sinθ(2/Yhkl)1/2 along the x-axis. In all of the W-H graphs, it can be observed that some of the implanted samples present a negative and a positive slope; a negative and a positive slope in the plot indicate the presence of compressive and tensile strain in the material.

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“…The study of sheath formation at the boundary of the plasma is of great practical importance. In plasma immersion ion implantation (PIII) (Mändl et al 1997;Sheridan et al 1998;Zeng et al 1999;Qi et al 2000;Bilek 2001;Yukimura 2001;Mukherjee et al 2002;Kwok et al 2003;Lacoste and Pelletier 2003;Masamune and Yukimura 2003;Ma et al 2003;Rauschenbach and Mändl 2003;Tian et al 2004Tian et al , 2005Tian et al , 2009Meige et al 2005;Sakudo et al 2006;Ghomi et al 2007Ghomi et al , 2009Huang et al 2007;Li and Wang 2007;Mukherjee et al 2007;Ghomi and Ghasemkhani 2009;Lejars et al 2010;Li et al 2010Li et al , 2012Zhu et al 2011), a plasmacontaining species to be implanted into a substrate is generated by an external plasma source or by the negative bias applied to the substrate (Conrad et al 1987;Meige et al 2005). After the negative bias is applied, electrons are repelled away from the surface leaving heavy ions forming an ion matrix sheath.…”

Section: Introductionmentioning

confidence: 99%

Numerical analysis of monoenergetic electrons energy effect on dynamic potential profile of plasma sheath

Sharifian

2013

J. Plasma Phys.

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The dynamic behavior of the electric potential distribution of a plasma sheath region in the presence of monoenergetic electrons with two different values of energy, larger (fast electrons) and smaller (slow electrons) than the cathode potential energy, is examined numerically by the finite difference method. Exploring and comparing the plots of numerical computation results shows that the time evolution of the non-monotonic potential distribution heavily depends on the energy of monoenergetic electrons.

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Uniformity enhancement of incident dose on concave surface in plasma immersion ion implantation assisted by beam-line ion source

Cited by 8 publications

References 13 publications

Dynamics of the collisional sheath around a planar target with a trench

Dynamics of the collisional sheath around a planar target with a trench

Understanding the Microstructure Evolution of 8Cr4Mo4V Steel under High-Dose-Rate Ion Implantation

Numerical analysis of monoenergetic electrons energy effect on dynamic potential profile of plasma sheath

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