Uniform Deposition of Titanium Dioxide Films by Chemical Vapor Deposition (CVD)

Abstract

Titanium is a lightweight metal with an outstanding combination of properties which make it the material of choice for many different applications. This paper investigates the structure, surface characteristics and electrical properties of the Titanium Dioxide (TiO2) thin film, deposited by chemical vapor deposition (CVD). The deposition temperature was 1000°C with 3 different positions of the glass substrates. The surface morphologies were examined using a field emission scanning electron microscope (FESEM) and an atomic force microscopy (AFM). In order to investigate the structural properties, the TiO2thickness was measured using a surface profiler. The optical properties of TiO2were measured using an ultraviolet visible spectroscopy (UV-Vis). The surface morphology was found to be sensitive to the deposition parameters and the growth TiO2is more uniform when the position of substrate is closed to the starting material.