Controllable preparation and improved performance of TiO₂ photocatalysts with various structures

A comprehensive review of oxygen vacancy modified photocatalysts: synthesis, characterization, and applications

“…In the field of semiconductor photocatalytic technology, the process of photocatalysis involves three distinct steps: (1) generation of photoexcited charges – where photons are absorbed by the semiconductor material leading to the creation of electron–hole pairs; (2) separation and transportation of charges – wherein photoexcited electron–hole pairs undergo segregation within the bulk phase of the catalyst and migrate towards the surface of the photocatalysts; and (3) occurrence of surface reactions – involving redox reactions between electrons and holes taking place on the surface of the photocatalysts. Metal oxide semiconductors, such as TiO 2 , 2–13 ZnO, 14–28 WO 3 , 29–32 BiOX, 33–35 In 2 O 3 , 36–41 SnO 2 , 42–47 and CuO 48–53 have been extensively investigated as photocatalysts due to their exceptional stability under light irradiation. However, their photocatalytic performance remains limited by inadequate absorption of visible light, the propensity of carriers to recombine during migration, and high-energy barriers for reactant capture and activation.…”

Low‐Temperature Atomic Layer Deposition of Double‐Layer Water Vapor Barrier for High Humidity Stable Perovskite Solar Cells

“…Therefore, in order to effectively isolate water vapor, in addition to the above optimization of perovskite itself, it is also necessary to optimize the process, select appropriate water blocking materials inside the device, and obtain high‐quality film, so that perovskite devices can maintain long‐term stability. [ 30–32 ]…”

“…Therefore, in order to effectively isolate water vapor, in addition to the above optimization of perovskite itself, it is also necessary to optimize the process, select appropriate water blocking materials inside the device, and obtain high-quality film, so that perovskite devices can maintain long-term stability. [30][31][32] There are many ways to prepare high-quality thin films. Among them, atomic layer deposition (ALD) is based on the chemical reactions between target product precursor and oxidizing precursors.…”