2021
DOI: 10.3390/membranes12010007
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Understanding the Origin of the Hysteresis of High-Performance Solution Processed Polycrystalline SnO2 Thin-Film Transistors and Applications to Circuits

Abstract: Crystalline tin oxide has been investigated for industrial applications since the 1970s. Recently, the amorphous phase of tin oxide has been used in thin film transistors (TFTs) and has demonstrated high performance. For large area electronics, TFTs are well suited, but they are subject to various instabilities due to operating conditions, such as positive or negative bias stress PBS (NBS). Another instability is hysteresis, which can be detrimental in operating circuits. Understanding its origin can help fabr… Show more

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Cited by 11 publications
(11 citation statements)
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“…Hysteresis characteristics could not be seen for the TFT. This indicates an excellent interface between the c-IGZO and SiO 2 by plasma-enhanced chemical vapor deposition (PECVD) as shown in Figure i . Note that the average density of interface traps ( D it ) for the 20 c-IGZO TFTs is 5.62 × 10 11 cm –2 eV –1 , indicating low interface trap density …”
Section: Results and Discussionmentioning
confidence: 81%
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“…Hysteresis characteristics could not be seen for the TFT. This indicates an excellent interface between the c-IGZO and SiO 2 by plasma-enhanced chemical vapor deposition (PECVD) as shown in Figure i . Note that the average density of interface traps ( D it ) for the 20 c-IGZO TFTs is 5.62 × 10 11 cm –2 eV –1 , indicating low interface trap density …”
Section: Results and Discussionmentioning
confidence: 81%
“…This indicates an excellent interface between the c-IGZO and SiO 2 by plasma-enhanced chemical vapor deposition (PECVD) as shown in Figure 2i. 58 Note that the average density of interface traps (D it ) for the 20 c-IGZO TFTs is 5.62 × 10 11 cm −2 eV −1 , indicating low interface trap density. 54 Figure 3f shows the performance statistics of the TFT parameters of the c-IGZO TFTs.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…The Si 3 N 4 substrate used in the experiment was divided into three sets, and its roughness was 0.03 μm, 0.1 μm, and 0.4 μm, respectively. It can be seen from sets A–D that the roughness of the diamond film was similar to that of the Si 3 N 4 substrate, and both of them were improved, which may be due to the fact that diamond grains grow in different directions on rough substrates, and the roughness is amplified by the size of diamond grains themselves [ 10 ]. The roughness of the diamond film is proportional to the roughness of the substrate.…”
Section: Resultsmentioning
confidence: 99%
“…Te N-type semiconductor, SnO 2 (nanostructured tin dioxide), with a bandgap width of nearly 3.6 eV, has a wide range of applications. SnO 2 also possesses excellent optical and electrical properties, making it suitable for photocatalysis, solar cells, gas sensors, transistors, and transparent electrodes, and displays high antibacterial activity [18][19][20][21][22][23].…”
Section: Introductionmentioning
confidence: 99%