Abstract:Diamond films were deposited on silicon nitride (Si3N4) substrates with three different roughnesses using the method of hot-filament chemical vapor deposition (HFCVD). The tribological properties of the film were studied by changing the deposition time, deposition distance, and methane (CH4) concentration. The friction coefficient, delamination threshold load, and wear rate of the diamond films were tested and calculated using the reciprocating friction and wear test under dry friction conditions. The results … Show more
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