“…LaFeO 3 thin films are an important class of functional materials because of their structural stability and unique electromagnetic, catalytic, and gas-sensitive properties [ 15 , 16 , 17 , 18 ]. A variety of methods, such as pulsed-laser deposition (PLD) [ 19 ], molecular-beam epitaxy (MBE) [ 20 ], reductive annealing [ 21 ], and chemical vapor deposition (CVD) [ 22 ], have been applied to prepare epitaxial thin films. Compared to these methods for preparing epitaxial films, the one-step hydrothermal preparation of epitaxial films has the advantages of mild conditions, a lower preparation cost, and a simple procedure, so it is an attractive alternative method to the abovementioned costly techniques [ 23 , 24 ].…”