Ultrathin sputtered silver films protected by ALD alumina: Comparison of in-situ investigation with ex-situ resistance and ellipsometric measurements

Belosludtsev, Alexandr; Sytchkova, Anna; Kyžas, Naglis; Bitinaitis, Ignas; Simniškis, R.; Drazdys, Ramutis

doi:10.1016/j.vacuum.2021.110669

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“…Let us also mention that the thickness dependence investigated here is restricted to closed metal films, i.e., it is not due to a change with growth morphology of a metal island film [17,[22][23][24][25]. In the present study, we will therefore assume that the films are thick enough such that they can be assumed as closed films, and not as a sort of island films.…”

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confidence: 99%

Spectrophotometric Characterization of Thin Semi-Transparent Aluminum Films Prepared by Electron Beam Evaporation and Magnetron Sputtering

et al. 2022

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Aluminum thin films with thicknesses between approximately 10 and 60 nm have been deposited by evaporation and sputtering techniques. Layer characterization focused on reflectance, optical constants, and surface quality. Reflectance fits have been performed using a merger of three standard dispersion models, namely the Drude model, the Lorentzian oscillator model, and the beta-distributed oscillator model. A thickness dependence of the optical constants could be established in the investigated thickness range.

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