Ultrathin film deposition by pulsed laser ablation using crossed beams

Gorbunov, A.; Pompe, W.; Sewing, A.; Gaponov, S. V.; Akhsakhalyan, A. D.; Zabrodin, I. G.; Kas’kov, I. A.; Klyenkov, E.B.; Морозов, Андрей Павлович; Salaschenko, N.N.; Dietsch, R.; Mai, H.; Völlmar, S.

doi:10.1016/0169-4332(95)00537-4

Cited by 48 publications

(9 citation statements)

References 5 publications

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“…The films were produced by cross-beam pulsed laser deposition (CBPLD) described in detail elsewhere [2,3]. The average laser power density on the target surface was 0.5 -2 GW/cm2 in 1 -2 mm diameter laser spots.…”

Section: Methodsmentioning

confidence: 99%

<title>Structural peculiarities of metal alloy and multilayer films synthesized from laser erosion plasma</title>

et al. 2001

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Section: Methodsmentioning

confidence: 99%

<title>Structural peculiarities of metal alloy and multilayer films synthesized from laser erosion plasma</title>

et al. 2001

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“…The bulk of the pattern investigations was carried out by an atomic force microscope (AFM) Nanoscope lila (Digital Instruments, Santa Barbara). In the experiments we have used thin (3 to 60 nm) titanium films deposited on glass by cross-beam pulsed laser deposition [10] in vacuum.…”

Section: Methodsmentioning

confidence: 99%

<title>Self-limitation of laser-induced thermochemical reactions in ultrathin films</title>

Gorbunov

Eichler

Pompe

et al. 1997

Nonresonant Laser-Matter Interaction (NLMI-9)

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Lateral self-limitation ofthe cw-laser-indnced local oxidation ofultrathin (3-60 nm,) titaniumfilms in air is studied It is shown, that the brightening ofiheflirns on transparent substrate upon through -oxidation f orms a negativefeedbcick to this highly-nonlinear process allowing stable writing oftransparent oxide line structures narrower than the diffraction lirniiedfocused laser spot. The optimum metaiflim thickness to obtain the greatest optical contrast with the highest resolulion is ofthe order ofthe light absorption length in the metal. Transparent isolated oxide lines and gratings with periocLc down to 250 nm and line width down to 165 nm were recorded in 6 -15 nni thick Tiflims on glass by using the radiation ofthe Ar ion laser (,Z=488, 514 nm).

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“…The feature of longwave laser ablation of wide-band-gap materials is nonlinear light absorption leading to the macroscopic solid and liquid particles presence in the vapour phase. To obtain a high quality SnO 2 :Sb films we used both: reactive laser ablation and crossbeam techniques described in [16,17]. Two Sn:Sb metallic targets were ablated in an reactive oxygen flow at the pressure 0.15 torr by two focused laser beams.…”

Section: Single-crystal Sno 2 Films Depositionmentioning

confidence: 99%

TRANSPARENT FERROELECTRIC FIELD EFFECT TRANSISTOR WITH A SINGLE-CRYSTAL SnO₂ CHANNEL

Titkov

Пронин

Liniichuk

et al. 2005

Integrated Ferroelectrics

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Ultrathin film deposition by pulsed laser ablation using crossed beams

Cited by 48 publications

References 5 publications

<title>Structural peculiarities of metal alloy and multilayer films synthesized from laser erosion plasma</title>

<title>Structural peculiarities of metal alloy and multilayer films synthesized from laser erosion plasma</title>

<title>Self-limitation of laser-induced thermochemical reactions in ultrathin films</title>

TRANSPARENT FERROELECTRIC FIELD EFFECT TRANSISTOR WITH A SINGLE-CRYSTAL SnO₂ CHANNEL

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Ultrathin film deposition by pulsed laser ablation using crossed beams

Cited by 48 publications

References 5 publications

<title>Structural peculiarities of metal alloy and multilayer films synthesized from laser erosion plasma</title>

<title>Structural peculiarities of metal alloy and multilayer films synthesized from laser erosion plasma</title>

<title>Self-limitation of laser-induced thermochemical reactions in ultrathin films</title>

TRANSPARENT FERROELECTRIC FIELD EFFECT TRANSISTOR WITH A SINGLE-CRYSTAL SnO2 CHANNEL

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TRANSPARENT FERROELECTRIC FIELD EFFECT TRANSISTOR WITH A SINGLE-CRYSTAL SnO₂ CHANNEL