Herein, we report
the first demonstration of a single-step,
in situ
growth of NiS
2
nanostructures from a
single-source precursor onto a flexible substrate as a versatile platform
for an effective nonvolatile memristor. The low temperature, solution-processed
deposition of NiS
2
thin films exhibits a wide band gap
range, spherical-flower-like morphology with high surface area and
porosity, and negligible surface roughness. Moreover, the fabricated
Au/NiS
2
/ITO/PET memristor device reveals reproducible bipolar
resistive switching (RS) at low operational voltages under both flat
and bending conditions. The flexible device shows stable RS behavior
for multiple cycles with a good memory window (∼10
2
) and data retention of up to 10
4
s. The switching of
a device between a high-resistance state and a low-resistance state
is attributed to the filamentary conduction based on sulfur ion migration
and sulfur vacancies and plays a key role in the outstanding memristive
performance of the device. Consequently, this work provides a simple,
scalable, solution-processed route to fabricate a flexible device
with potential applications in next-generation neuromorphic computing
and wearable electronics.