Ultrafiltration based on various polymeric membranes for recovery of spent tungsten slurry for reuse in chemical mechanical polishing process

Sanusi, Nur Fatin Amalina Muhammad; Yusoff, Mohd Hizami Mohd; Seng, Ooi Boon; Marzuki, Mohd Sabirin; Abdullah, Ahmad Zuhairi

doi:10.1016/j.memsci.2017.11.034

Cited by 14 publications

(2 citation statements)

References 22 publications

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“…Juang et al [51] used UF and RO separation method at the same time, and they were able to eliminate 99% of fine particles through UF pretreatment. Sanusi et al [52] recycled spent tungsten CMP slurry using various ultrafiltration membranes such as polysulfone (PS), polyethersulfone (PES), and polyvinylidene fluoride (PVDE).…”

Section: Cmp Wastewater Treatmentmentioning

confidence: 99%

Approaches to Sustainability in Chemical Mechanical Polishing (CMP): A Review

Lee

Kim

Jeong

2021

Int. J. of Precis. Eng. and Manuf.-Green Tech.

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Chemical mechanical polishing (CMP) is an essential planarization process for semiconductor manufacturing. The application of CMP has been increasing in semiconductor fabrication for highly integrated devices. Recently, environmental burden caused by the CMP process was assessed because of interest in the global environment. In this study, the previously reported impacts of CMP on the environment and studies conducted on developing various methods to reduce environmental burden are reviewed. In addition to analyzing the impacts of CMP, this paper introduces a method for treating CMP wastewater and improving the material removal efficiency through the improvement of CMP consumables. Finally, the authors review research on hybridization of the CMP process and discuss the direction in which CMP technology will progress to improve sustainability in the future.

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Section: Cmp Wastewater Treatmentmentioning

confidence: 99%

Approaches to Sustainability in Chemical Mechanical Polishing (CMP): A Review

Lee

Kim

Jeong

2021

Int. J. of Precis. Eng. and Manuf.-Green Tech.

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“…The fluoride-rich wastewater with a high fluoride concentration (e.g., 1–50 g L –1 ) causes severe crises for human health, − while the fluoride emission discharge is limited to a median value of 15 mg L –1 . , Silica is a typical waste in silica-rich wastewater . The high concentration of nanosized silica particles (around 2.6 g L –1 SiO 2 ) in wastewater causes environmental issues such as the production of hazardous oxyradicals. − Traditionally, the treatment methods such as precipitation and coagulation–flocculation are applied to treat the fluoride and silica in semiconductor wastewaters separately. , However, the waste solid (e.g., calcium fluoride and silica slurry) generation will cause secondary pollution to the environment. On the contrary, capturing fluoride and silica from different wastewaters (e.g., fluoride-rich wastewater and silica-rich wastewater) as well as recovery of the ionic products such as sodium silicofluoride (Na 2 SiF 6 ) will eliminate pollutants from the environment and bring economic values simultaneously.…”

Section: Introductionmentioning

confidence: 99%

Recovery of Fluoride-Rich and Silica-Rich Wastewaters as Valuable Resources: A Resource Capture Ultrafiltration–Bipolar Membrane Electrodialysis-Based Closed-Loop Process

Qiu

Ren

Xia

et al. 2022

Environ. Sci. Technol.

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Traditional technologies such as precipitation and coagulation have been adopted for fluoride-rich and silica-rich wastewater treatment, respectively, but waste solid generation and low wastewater processing efficiency are still the looming concern. Efficient resource recovery technologies for different wastewater treatments are scarce for environment and industry sustainability. Herein, a resource capture ultrafiltration–bipolar membrane electrodialysis (RCUF-BMED) system was designed into a closed-loop process for simultaneous capture and recovery of fluoride and silica as sodium silicofluoride (Na2SiF6) from mixed fluoride-rich and silica-rich wastewaters, as well as achieving zero liquid discharge. This RCUF-BMED system comprised two key parts: (1) capture of fluoride and silica from two wastewaters using acid, and recovery of the Na2SiF6 using base by UF and (2) UF permeate conversion for acid/base and freshwater generation by BMED. With the optimized RCUF-BMED system, fluoride and silica can be selectively captured from wastewater with removal efficiencies higher than 99%. The Na2SiF6 recovery was around 72% with a high purity of 99.1%. The aging and cyclic experiments demonstrated the high stability and recyclability of the RCUF-BMED system. This RCUF-BMED system has successfully achieved the conversion of toxic fluoride and silica into valuable Na2SiF6 from mixed wastewaters, which shows great application potential in the industry–resource–environment nexus.

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Selective removal of tungstate anions from aqueous solutions by surface anion‐imprinted ceramic membranes

Dong

Zeng

Zhou

et al. 2018

J of Chemical Tech & Biotech

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BACKGROUND: It is significantly important to develop new technologies and materials for removal of tungstate anions (W(VI)) from aqueous solutions. An ion imprinted membrane not only possesses all virtues of a separation membrane, but also has tailor-made recognition sites. In this work, a novel surface anion-imprinted ceramic membrane (IIP-PEI/CM) was fabricated to remove W(VI) selectively from aqueous solutions. RESULTS: FT-IR, XPS, TGA, SEM, streaming potential, pore size distribution and water flux confirmed the successful fabrication of IIP-PEI/CM. With increasing pH, binding capacities (Q e ) of W(VI) onto IIP-PEI/CM and non-imprinted membrane (NIP-PEI/CM) rapidly decreased. At pH = 2.0, Q e values of IIP-PEI/CM and NIP-PEI/CM were 139.4 and 47.9 mg 100 g −1 , respectively. Binding equilibrium was achieved within 3 min, showing an ultra-fast kinetic process. Compared with NIP-PEI/CM, IIP-PEI/CM had higher selectivity for W(VI) in the presence of Mo(VI) and Cr(VI) ions, and its selectivity coefficients for W(VI)/Mo(VI) and W(VI)/Cr(VI) were 15.47 and 19.74, respectively. During dynamic filtration, IIP-PEI/CM was effective and selective for removal of W(VI), and it had a good reusability. Protonated amine groups within PEI participated the uptake of W(VI) by electrostatic interactions. CONCLUSION: IIP-PEI/CM showed ultrafast and selective binding of W(VI) anions, and has potential application for W(VI) removal/recovery from aqueous solutions.

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Ultrafiltration based on various polymeric membranes for recovery of spent tungsten slurry for reuse in chemical mechanical polishing process

Cited by 14 publications

References 22 publications

Approaches to Sustainability in Chemical Mechanical Polishing (CMP): A Review

Approaches to Sustainability in Chemical Mechanical Polishing (CMP): A Review

Recovery of Fluoride-Rich and Silica-Rich Wastewaters as Valuable Resources: A Resource Capture Ultrafiltration–Bipolar Membrane Electrodialysis-Based Closed-Loop Process

Selective removal of tungstate anions from aqueous solutions by surface anion‐imprinted ceramic membranes

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