2012
DOI: 10.1063/1.4763476
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Ultra-high hole mobility exceeding one million in a strained germanium quantum well

Abstract: In this paper, we report a Hall mobility of one million in a germanium two-dimensional hole gas. The extremely high hole mobility of 1.1 × 106 cm2 V−1 s−1 at a carrier sheet density of 3 × 1011 cm−2 was observed at 12 K. This mobility is nearly an order of magnitude higher than any previously reported. From the structural analysis of the material and mobility modeling based on the relaxation time approximation, we attribute this result to the combination of a high purity Ge channel and a very low background im… Show more

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Cited by 86 publications
(75 citation statements)
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“…Strain in a Ge epilayer or QW can be tuned by growth onto a silicon germanium (SiGe) relaxed buffer layer, the magnitude of the strain is tuned through the Ge composition of the buffer. Strain changes the mobility of carriers in Ge, with the highest mobilities to date found in Ge layers grown on an $70-80% Ge SiGe buffer layer [16][17][18]. Ge is highly compatible with conventional Si-based technology, and can be grown with high material and electrical quality onto standard orientation silicon substrates.…”
mentioning
confidence: 99%
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“…Strain in a Ge epilayer or QW can be tuned by growth onto a silicon germanium (SiGe) relaxed buffer layer, the magnitude of the strain is tuned through the Ge composition of the buffer. Strain changes the mobility of carriers in Ge, with the highest mobilities to date found in Ge layers grown on an $70-80% Ge SiGe buffer layer [16][17][18]. Ge is highly compatible with conventional Si-based technology, and can be grown with high material and electrical quality onto standard orientation silicon substrates.…”
mentioning
confidence: 99%
“…One of the key advances necessary to observe the Rashba S-O interaction using SdH oscillations is the significant enhancement of 2D hole mobility at low temperatures. Recently, hole mobilities in excess of 1,300,000 cm 2 V À1 s À1 were achieved in strained Ge QW heterostructures [16,[62][63][64], with effective masses as low as 0.035 m 0 [65] comparable to the electron effective mass in certain III-V compound semiconductors and to the light hole mass in bulk Ge. The first observation of the cubic Rashba interaction in a Ge QW utilised a SiGe heterostructure containing a 2DHG in a pure Ge, with a low temperature mobility of 450,000 cm 2 V À1 s À1 [57].…”
mentioning
confidence: 99%
“…Thus, the top of the valence band can be tuned to the HH state. Recent advances in Ge and SiGe epitaxial growth technology revealed that it is possible to fabricate a high crystal quality strained-Ge=SiGe QW on Si substrates [23,24]. Thus, strained Ge=SiGe provides a good platform to study the cubic-Rashba SOI in simple single element semiconductors and will offer an interesting comparison with existing SOI theory.…”
mentioning
confidence: 99%
“…Mobility at the lowest temperatures is very high (780 000 cm 2 /Vs), approaching the record value in this class of heterostructures. 1 The carrier density is 2 Â 10 11 cm À2 at 0.3 K, indicating a relatively high transferal of carriers from the doping layer into the QW region.…”
mentioning
confidence: 99%
“…Low temperature 2DHG mobility in excess of 1.3 Â 10 6 cm 2 /Vs has been achieved. 1,[4][5][6] The study of quantum transport behaviour in these 2DHGs at low temperatures, in particular, the Shubnikov de-Haas (SdH) oscillations that arise from Landau levels created under an applied magnetic field, allows us to determine the key parameters such as effective mass, as well as the carrier densities and diffusive and quantum transport scattering parameters.…”
mentioning
confidence: 99%