2006 21st IEEE Non-Volatile Semiconductor Memory Workshop
DOI: 10.1109/.2006.1629493
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Ultra High Density HfO2 Nanodots Memory for Scaling

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“…However, previous approaches for charge trapping in the OTFD have used CPs as a continuous charge-trapping layer to replace the floating gate in NVMs [12]. Although some studies have investigated the integration of solution-processed NPs into OTFDs to mimic the charge-trapping mechanisms used in nanoscale solid-state devices that employ NPs, the challenge arises due to incompatibility with traditional CMOS processes [15][16][17][18][19][20][21][22][23]…”
Section: Introductionmentioning
confidence: 99%
“…However, previous approaches for charge trapping in the OTFD have used CPs as a continuous charge-trapping layer to replace the floating gate in NVMs [12]. Although some studies have investigated the integration of solution-processed NPs into OTFDs to mimic the charge-trapping mechanisms used in nanoscale solid-state devices that employ NPs, the challenge arises due to incompatibility with traditional CMOS processes [15][16][17][18][19][20][21][22][23]…”
Section: Introductionmentioning
confidence: 99%