Ueber die elektrostatische Induction und die Verzögerung des Stroms in Flaschendrähten

Siemens, Werner

doi:10.1002/andp.18571780905

Cited by 283 publications

(99 citation statements)

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“…2 In fact, the atmospheric nonequilibrium plasma was developed over 100 years ago by generating ozone using dielectric barrier discharges. 3 Compared with low-pressure plasmas, atmospheric pressure plasmas provide various advantages including reduction in equipment cost and enhancement in plasma chemistry. Atmospheric pressure plasmas have found applications in thin film deposition, etching, decomposition of hazardous pollutants, polymer modification, and sterilization, among others.…”

Section: Optical Emission Spectroscopy Of Atmospheric Pressure Microwmentioning

confidence: 99%

Optical emission spectroscopy of atmospheric pressure microwave plasmas

Jia

Fujiwara

Kondo

et al. 2008

Journal of Applied Physics

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The optical emission behaviors of Ar, He, and Ar+He plasmas generated in air using an atmospheric pressure microwave plasma source have been studied employing optical emission spectroscopy (OES). Emissions from various source gas species and air were observed. The variations in the intensities and intensity ratios of specific emissions as functions of the microwave power and gas flow rate were analyzed to investigate the relationship between the emission behavior and the plasma properties. We find that dependence of the emission behavior on the input microwave power is mainly determined by variations in electron density and electron temperature in the plasmas. On the other hand, under different gas flow rate conditions, changes in the density of the source gas atoms also significantly affect the emissions. Interestingly, when plasma is generated using an Ar+He mixture, emissions from excited He atoms disappear while a strong Hα signal appears. The physics behind these behaviors is discussed in detail.

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Section: Optical Emission Spectroscopy Of Atmospheric Pressure Microwmentioning

confidence: 99%

Optical emission spectroscopy of atmospheric pressure microwave plasmas

Jia

Fujiwara

Kondo

et al. 2008

Journal of Applied Physics

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“…IRST formal reports, written by Siemens [1], addressing the study of the dielectric barrier discharges (DBDs), date from 19th century. For the first DBD reactors, mainly studied for the Ozone production, simple and low-cost voltage-mode supplies were employed.…”

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confidence: 99%

Efficiency of an Exciplex DBD Lamp Excited Under Different Methods

Florez¹,

Schitz²,

Piquet³

et al. 2018

IEEE Trans. Plasma Sci.

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OATAO is an open access repository that collects the work of Toulouse researchers and makes it freely available over the web where possible. Abstract-Three different electrical generators have been designed and used to supply an exciplex dielectric barrier discharge lamp in order to elucidate the influence of each one of these supplying strategies over the system performance; the first method consists on supplying the lamp with short bipolar voltage pulses; the second and third methods are based on semiresonant converters were current pulses, of controlled duration and magnitude, are injected into the lamp. For each one of the generators, measurements of the lamp and supply efficiency, are performed and analyzed, at different levels of power (up to 130 W) and operating frequencies (60-90 kHz). From the experimental results, the pulsed voltage-mode approach has allowed obtaining the highest lamp efficiency (7%), yet the maximum supply efficiency is offered by the resonant mode supplies. On the basis of the lamp and the supply efficiencies, the whole system performance is analyzed.Index Terms-Dielectric-barrier discharge (DBD), exciplex lamp, pulsed voltage, resonant converter, ultraviolet.

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“…222 Investigations in 1869 by Marcellin Berthelot (1827-1907), a famous French synthetic chemist, on the decomposition of gases such as methane [CH 4 ] in glow discharges 223 led to the development of plasmaenhanced chemical vapor deposition (PE-CVD). In 1876, J. Ogier reported PE-CVD growth of Si:H and SiN x films from silane [SiH 4 ] and SiH 4 þ N 2 precursors, respectively.…”

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confidence: 99%