2008
DOI: 10.1103/physrevb.78.113202
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Two FeH pairs inn-type Si and their implications: A theoretical study

Abstract: Experimental evidence for interstitial ͕FeH͖ pairs in n-type Si stems from thermally stimulated capacitance ͑TSCAP͒. Electron-paramagnetic resonance ͑EPR͒ data have also been interpreted in terms of ͕FeH͖ pairs. We present theoretical studies of two ͕FeH͖ pairs. The properties of the first match those of the TSCAP center but are incompatible with the EPR center. The second is a possible candidate for the EPR center. If true, this suggests that high-temperature anneals can introduce substitutional Fe in concent… Show more

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Cited by 8 publications
(29 citation statements)
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References 53 publications
(35 reference statements)
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“…No further levels were found for Fe i H n defects. Although our results for Fe i H are not far from previous theoretical reports, 20 the Fe i H(0/+) level seems too deep to be connected to the 'E v + 0.32 eV' trap of Ref. 16.…”
Section: B Electronic Levelscontrasting
confidence: 97%
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“…No further levels were found for Fe i H n defects. Although our results for Fe i H are not far from previous theoretical reports, 20 the Fe i H(0/+) level seems too deep to be connected to the 'E v + 0.32 eV' trap of Ref. 16.…”
Section: B Electronic Levelscontrasting
confidence: 97%
“…In line with the calculations reported by Szwaki et al, 20 we predict that after trapping one hydrogen atom, the Fe i atom becomes more stable near the hexagonal site while connecting to H along the trigonal axis. The resulting Fe i H structure is depicted in Fig.…”
Section: A Defect Structuressupporting
confidence: 92%
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