2022
DOI: 10.1103/physrevb.106.144414
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Two-channel anomalous Hall effect originating from the intermixing in Mn2CoAl/Pd thin films

Abstract: The anomalous Hall effect (AHE) is an electronic transport phenomenon with rich physics. In thin magnetic films and multilayers, an unusual peak observed in AHE is often identified as the topological Hall effect (THE), induced by topologically nontrivial spin textures. However, it is a challenge to determine whether this unusual peak truly originates from such spin textures or is an artifact due to inhomogeneities. In this work, we systematically study the Pd thickness and temperature dependence of the Hall ef… Show more

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Cited by 5 publications
(1 citation statement)
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“…A signature feature of THE i.e. hump-like features in Hall resistivity is seen in presence of a magnetic field and within the temperature ranging from 10 to 120 K. In this connection, it is indispensable to distinguish the genuine occurrence of hump-like features of THE as an artifact may come from the inhomogeneity, temperature or electric field range and two phases with opposite extraordinary or anomalous Hall effect polarity [20,21]. Here, interfacial DMI induced THE is confirmed from the magnitude of THE which rapidly decreases with increasing thickness of SrRuO 3 layer and fully vanishes above 6 uc.…”
Section: The At Magnetic Oxide Interfacesmentioning
confidence: 99%
“…A signature feature of THE i.e. hump-like features in Hall resistivity is seen in presence of a magnetic field and within the temperature ranging from 10 to 120 K. In this connection, it is indispensable to distinguish the genuine occurrence of hump-like features of THE as an artifact may come from the inhomogeneity, temperature or electric field range and two phases with opposite extraordinary or anomalous Hall effect polarity [20,21]. Here, interfacial DMI induced THE is confirmed from the magnitude of THE which rapidly decreases with increasing thickness of SrRuO 3 layer and fully vanishes above 6 uc.…”
Section: The At Magnetic Oxide Interfacesmentioning
confidence: 99%