2006
DOI: 10.1016/j.sna.2005.11.010
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Tuning the shape and curvature of micromachined cantilevers using multiple plasma treatments

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Cited by 8 publications
(6 citation statements)
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“…Moreover, using the combination of plasma treatments along beam width can also generate a flat cantilever. 24) 4. Conclusions…”
Section: Combination Of Two Nh 3 Plasma Treatmentsmentioning
confidence: 99%
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“…Moreover, using the combination of plasma treatments along beam width can also generate a flat cantilever. 24) 4. Conclusions…”
Section: Combination Of Two Nh 3 Plasma Treatmentsmentioning
confidence: 99%
“…The radius of the curvature of a 200-mmlong cantilever was 1.85 mm before plasma treatment, and In general, the thin-film equivalent gradient residual stresses can be modified by physical and chemical methods of plasma treatment. [23][24][25] For instance, ion bombardment is a well known physical effect, 23) whereas the formation of chemical bonds is a typical chemical approach. 24,25) In this study, the O 2 plasma treatment leads to a compressive residual stress on the surface, so that the equivalent gradient residual stress bent the cantilever concave downward.…”
Section: Treatment With Single Plasmamentioning
confidence: 99%
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“…The research studies underlying the role of cold plasma on shape change or bending are limited. Some of them include morphing the shape-change behavior of Dionaea muscipula (Venus flytrap) and Mimosa pudica L. plants (Volkov, Xu, & Kolobov, 2017), modifying the curvature and shape of SiO 2 cantilevers (Su et al, 2006), and improved bending of ionic polymer-metal composite (IPMC) actuators (Kim, Lee, & Kim, 2007). Recently, there has been an increase in the applications of cold plasma in food processing.…”
Section: Introductionmentioning
confidence: 99%
“…1. The present process contains three key steps: ͑i͒ the plasma treatment, 9 ͑ii͒ the octadecyltrichlorosilane ͑OTS͒ self-assembled monolayer ͑SAM͒ coating, 10 and ͑iii͒ the contact displacement electroless ͑CDE͒ plating. 11 These techniques are employed to replace the conventional photolithography and film deposition processes on highly structured 3D surfaces.…”
mentioning
confidence: 99%