Tuning the electrical conductivity of Pt-containing granular metals by postgrowth electron irradiation

Porrati, F.; Sachser, Roland; Schwalb, Christian H.; Frangakis, Achilleas S.; Huth, Michael

doi:10.1063/1.3559773

Cited by 103 publications

(188 citation statements)

References 41 publications

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“…In a series of recent papers we have started to investigate the effects of electron beam irradiation on the microstructure of FEBID samples [19]. For example, it was shown that during electron-beam irradiation the carbon-like matrix of Pt-C nanocomposites tends to graphitize, while the intergrain distance of the P t nanograins is reduced, which is due to carbon removal and to an increase of the diameter of the grains [30]. Furthermore, it was shown that electron-beam irradiation induces a roomtemperature transformation from an amorphous phase into a crystalline one for CoP t nanostructures [16].…”

Section: Discussionmentioning

confidence: 99%

Fabrication of FeSi and Fe3Si compounds by electron beam induced mixing of [Fe/Si]2 and [Fe3/Si]2 multilayers grown by focused electron beam induced deposition

Porrati

Sachser

Gazzadi

et al. 2016

Journal of Applied Physics

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Fe-Si binary compounds have been fabricated by focused electron beam induced deposition by the alternating use of iron pentacarbonyl, F e(CO) 5 , and neopentasilane, Si 5 H 12 as precursor gases. The fabrication procedure consisted in preparing multilayer structures which were treated by low-energy electron irradiation and annealing to induce atomic species intermixing. In this way we are able to fabricate F eSi and F e 3 Si binary compounds from [F e/Si] 2 and [F e 3 /Si] 2 multilayers, as shown by transmission electron microscopy investigations. This fabrication procedure is useful to obtain nanostructured binary alloys from precursors which compete for adsorption sites during growth and, therefore, cannot be used simultaneously.

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Section: Discussionmentioning

confidence: 99%

Fabrication of FeSi and Fe3Si compounds by electron beam induced mixing of [Fe/Si]2 and [Fe3/Si]2 multilayers grown by focused electron beam induced deposition

Porrati

Sachser

Gazzadi

et al. 2016

Journal of Applied Physics

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“…of a percolating path between the metallic nano-particles offers the possibility to precisely tune this system from the insulating regime across the metal-insulator transition (MIT) towards metallic conductance. [17,18,19]. However, residual carbon in the deposit after the post-treatment process leads to a maximum achievable value for the electrical conductivity which is two orders of magnitude lower as compared to bulk platinum.…”

Section: Introductionmentioning

confidence: 99%

Identifying the crossover between growth regimes via in-situ conductance measurements in focused electron beam induced deposition

Winhold¹,

Weirich²,

Schwalb³

et al. 2014

Nanofabrication

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Focused electron beam induced deposition presents a promising technique for the fabrication of nanostructures. However, due to the dissociation of mostly organometallic precursor molecules employed for the deposition process, prepared nanostructures contain organic residues leading to rather low conductance of the deposits. Post-growth treatment of the structures by electron irradiation or in reactive atmospheres at elevated temperatures can be applied to purify the samples. Recently, an in-situ conductance optimization process involving evolutionary genetic algorithm techniques has been introduced leading to an increase of conductance by one order of magnitude for tungsten-based deposits using the precursor W(CO)6. This method even allows for the optimization of conductance of nano-structures for which post-growth treatment is not possible or desirable. However, the mechanisms responsible for the observed enhancement have not been studied in depth. In this work, we identified the dwell-time dependent change of conductivity of the samples to be the major contributor to the change of conductance. Specifically, the chemical composition drastically changes with a variation of dwelltime resulting in an increase of the metal content by 15 at% for short dwell-times. The relative change of growth rate amounts to less than 25 % and has a negligible influence on conductance. We anticipate the in-situ genetic algorithm optimization procedure to be of high relevance for new developments regarding binary or ternary systems prepared by focused electron or ion beam induced deposition.

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“…For instance, Porrati et al showed that the height of EBID Pt structures was reduced by ~50% after electron beam irradiation for 40 min. 20 Similarly, heating EBID a-C structures deposited on Au thin films to 450 o C results in height variations of up to 75%. 14 As concerns the Raman analysis of the electrodes, Figures 3c and 3d show the spectral window of interest for the D and G bands in the pre-and postannealed states, respectively.…”

Section: Ebid Devicesmentioning

confidence: 99%

Structural changes of electron and ion beam-deposited contacts in annealed carbon-based electrical devices

et al. 2015

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The use of electron and ion beam deposition to make devices containing discrete nanostructures as interconnectors is a well-known nanofabrication process. Classically, onedimensional materials such as carbon nanotubes (CNT) have been electrically characterized by resorting to these beam deposition methods. While much attention has been given to the interconnectors, less is known about the contacting electrodes (or leads). In particular, the structure and chemistry of the electrode-interconnector interface is a topic that deserves more attention as it is critical to understand the device behavior. Here, the structure and chemistry of Pt electrodes, deposited either with electron or ion beams and contacted to a CNT, are analyzed before and after thermally annealing the device in vacuum. Free-standing Pt nanorods, acting as beam-deposited electrode models, are also characterized pre-and postannealing. Overall, the as-deposited leads contain a non-negligible amount of amorphous carbon that is consolidated, upon heating, as a partially graphitized outer shell enveloping a Pt core. This observation raises pertinent questions regarding the definition of electrodesnanostructure interfaces in electrical devices, in particular long-standing assumptions of metal-CNT contacts fabricated by direct beam deposition methods.

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Tuning the electrical conductivity of Pt-containing granular metals by postgrowth electron irradiation

Cited by 103 publications

References 41 publications

Fabrication of FeSi and Fe3Si compounds by electron beam induced mixing of [Fe/Si]2 and [Fe3/Si]2 multilayers grown by focused electron beam induced deposition

Fabrication of FeSi and Fe3Si compounds by electron beam induced mixing of [Fe/Si]2 and [Fe3/Si]2 multilayers grown by focused electron beam induced deposition

Identifying the crossover between growth regimes via in-situ conductance measurements in focused electron beam induced deposition

Structural changes of electron and ion beam-deposited contacts in annealed carbon-based electrical devices

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