Tuning the Composition and Nanostructure of Pt/Ir Films via Anodized Aluminum Oxide Templated Atomic Layer Deposition

Comstock, David J.; Christensen, Steven T.; Elam, Jeffrey W.; Pellin, Michael J.; Hersam, Mark C.

doi:10.1002/adfm.201000389

Cited by 64 publications

(53 citation statements)

References 50 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…[1][2][3][4][5][6][7][8][9] One noble metal ALD process that has attracted a lot of recent attention is that of platinum, based on (methylcyclopentadienyl)trimethylplatinum precursor ((MeCp)PtMe 3 ) and O 2 gas, as developed by Aaltonen et al 10 As it is amongst the most widely applied and studied processes, it can be considered a model system for noble metal ALD processes that are based on the availability of chemisorbed surface oxygen at the start of each precursor pulse. Several studies have been performed on the reaction products that are produced during the process, to obtain information about surface reactions and to better understand the reaction mechanism.…”

mentioning

confidence: 99%

Mass Spectrometry Study of the Temperature Dependence of Pt Film Growth by Atomic Layer Deposition

Erkens

Mackus

Knoops

et al. 2012

ECS J. Solid State Sci. Technol.

View full text Add to dashboard Cite

Document VersionPublisher's PDF, also known as Version of Record (includes final page, issue and volume numbers) Please check the document version of this publication:• A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and page numbers. Link to publication General rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.• Users may download and print one copy of any publication from the public portal for the purpose of private study or research.• You may not further distribute the material or use it for any profit-making activity or commercial gain • You may freely distribute the URL identifying the publication in the public portal ? Take down policyIf you believe that this document breaches copyright please contact us providing details, and we will remove access to the work immediately and investigate your claim. Insights into the temperature dependence of atomic layer deposition (ALD) of Pt using (methylcyclopentadienyl)trimethylplatinum, (MeCp)PtMe 3 , precursor and O 2 are presented, based on a study of reaction products by time-resolved quadrupole mass spectrometry (QMS) measurements. Above 250 • C, Pt ALD proceeds through unhindered O 2 dissociation at the Pt surface, inducing complete and instantaneous combustion of the precursor ligands. Quantification of the QMS data revealed that at 300 • C, approximately 20% of the C-atoms react during the precursor pulse, forming mainly CH 4 (∼18%) balanced by CO 2 (∼2%). The remaining 80% of the C-atoms are combusted during the O 2 pulse. Time-resolved data indicated that the combustion reactions compete with the hydrogenation reactions for the available surface carbon. Combustion reactions were found to be dominant, provided that a sufficient amount of chemisorbed oxygen is available. When the temperature drops below 250 • C, deposition becomes hindered by the presence of a carbonaceous surface layer of partially fragmented and dehydrogenated precursor ligands, formed during the precursor pulse. The carbonaceous layer limits dissociative chemisorption of O 2 and hence combustion reactions (leading to CO 2 ) whereas reduced surface reactivity also limits (de-)hydrogenation reactions (leading to CH 4 ). Below 100 • C, the carbonaceous layer fully prevents O 2 dissociation and ALD of Pt cannot proceed.

show abstract

mentioning

confidence: 99%

Mass Spectrometry Study of the Temperature Dependence of Pt Film Growth by Atomic Layer Deposition

Erkens

Mackus

Knoops

et al. 2012

ECS J. Solid State Sci. Technol.

View full text Add to dashboard Cite

show abstract

“…54 ALD is emerging as a useful method to engineer catalyst particles at the atomic level. [55][56][57][58][59] As demonstrated by Christiansen et al Owing to the development of noble metal 60 and transition metal ALD processes, 61 one can imagine a large number of different catalyst nanoparticles with tunable properties that can be synthesized by ALD. Surface passivation layers, such as organic ligands, which typically result from solvothermal and hydrothermal nanoparticle synthetic methods are avoided with the ALD process.…”

Section: Catalyst Engineering For Photoelectrochemical Electrodesmentioning

confidence: 99%

Atomic layer deposition for electrochemical energy generation and storage systems

Peng

Lewis

Hoertz

et al. 2011

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

View full text Add to dashboard Cite

Clean renewable energy sources (e.g., solar, wind, and hydro) offers the most promising solution to energy and environmental sustainability. On the other hand, owing to the spatial and temporal variations of renewable energy sources, and transportation and mobility needs, high density energy storage and efficient energy distribution to points of use is also critical. Moreover, it is challenging to scale up those processes in a cost-effective way. Electrochemical processes, including photoelectrochemical devices, batteries, fuel cells, super capacitors, and others, have shown promise for addressing many of the abovementioned challenges. Materials with designer properties, especially the interfacial properties, play critical role for the performance of those devices. Atomic layer deposition is capable of precise engineering material properties on atomic scale. In this review, we focus on the current state of knowledge of the applications, perspective and challenges of atomic layer deposition process on the electrochemical energy generation and storage devices and processes.

show abstract

“…Pt nanotubes or hybrid catalysts, have been successfully produced using ALD. [13][14][15] Liu et al for instance deposited Pt nanoparticles on carbon nanotubes (CNTs) support for fuel cell applications. 16 On the other hand, support-free and porous Pt nanostructures can be advantageous for certain applications, e.g., in aggressive environments where the supports are potentially not stable.…”

Section: Introductionmentioning

confidence: 99%

Synthesis of a 3D network of Pt nanowires by atomic layer deposition on a carbonaceous template

et al. 2014

View full text Add to dashboard Cite

The formation of a 3D network composed of free standing and interconnected Pt nanowires is achieved by a two-step method, consisting of conformal deposition of Pt by atomic layer deposition (ALD) on a forest of carbon nanotubes and subsequent removal of the carbonaceous template. Detailed characterization of this novel 3D nanostructure was carried out by transmission electron microscopy (TEM) and electrochemical impedance spectroscopy (EIS). These characterizations showed that this pure 3D nanostructure of platinum is self-supported and offers an enhancement of the electrochemically active surface area by a factor of 50.

show abstract

Tuning the Composition and Nanostructure of Pt/Ir Films via Anodized Aluminum Oxide Templated Atomic Layer Deposition

Cited by 64 publications

References 50 publications

Mass Spectrometry Study of the Temperature Dependence of Pt Film Growth by Atomic Layer Deposition

Mass Spectrometry Study of the Temperature Dependence of Pt Film Growth by Atomic Layer Deposition

Atomic layer deposition for electrochemical energy generation and storage systems

Synthesis of a 3D network of Pt nanowires by atomic layer deposition on a carbonaceous template

Contact Info

Product

Resources

About