Tuning cell adhesion by controlling the roughness and wettability of 3D micro/nano silicon structures

Ranella, Anthi; Barberoglou, M.; Bakogianni, S.; Fotakis, C.; Stratakis, Emmanuel

doi:10.1016/j.actbio.2010.01.016

Cited by 412 publications

(349 citation statements)

References 56 publications

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“…The assay protocol has been described in previous studies. 50 The different CNCs concentrations were tested in duplicates in each individual cell culture experiment and these experiments were repeated at least three times. For statistical analysis, the data were subjected to one way ANOVA followed by Tukey tests for multiple comparisons between pairs of means, using commercially available software (SPSS 21, IBM).…”

Section: D) Cell Viability Assaymentioning

confidence: 99%

Colloidal assemblies of oriented maghemite nanocrystals and their NMR relaxometric properties

et al. 2014

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Section: D) Cell Viability Assaymentioning

confidence: 99%

Colloidal assemblies of oriented maghemite nanocrystals and their NMR relaxometric properties

et al. 2014

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“…Ranella et al [23] have demonstrated that femtosecond laser-induced conical spikes on silicon surfaces can hinder the adhesion of fibroblast cells, at least for several days in culture. The laser irradiation was performed in an SF 6 atmosphere and the resulting surface with the laser-induced microstructures was super-hydrophobic.…”

Section: Introductionmentioning

confidence: 99%

Femtosecond laser-induced microstructures on Ti substrates for reduced cell adhesion

et al. 2017

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“…Compared with these methods, laser surface texturing process is reported to be less complicated with the potential to produce microstructures with high spatial resolution 8 . However, as Si has an elevated texturing threshold, requiring irradiation with pulse fluence to induce surface texturing in excess of its ablation threshold (~500 mJ/cm 2 ) 9 , texturing of Si surface has frequently been assisted by employing reactive gas atmospheres, such as that of a high pressure SF 6 environment 4,7,8 . Consequently, to modify wettability of the Si surface, numerous works have focused on chemical treatment by depositing organic 10 and inorganic films 2 , or using plasma or electron beam surface treatment 11,12 .…”

Section: Introductionmentioning

confidence: 99%

“…Selective area control of the Si surface has received significant attention for applications involving microfluidic and lab-on-chip devices 2,3 .This is often obtained either by nano-scale modification of the surface roughness or by chemical treatment of the surface 4 . The surface roughening or patterning to produce disordered or ordered surface structures on the Si surface include photolithography 5 , ion beam lithography 6 and laser techniques 7 . Compared with these methods, laser surface texturing process is reported to be less complicated with the potential to produce microstructures with high spatial resolution 8 .…”

Section: Introductionmentioning

confidence: 99%

Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment

Liu

Moumanis

Dubowski

2015

JoVE

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The wettability of silicon (Si) is one of the important parameters in the technology of surface functionalization of this material and fabrication of biosensing devices. We report on a protocol of using KrF and ArF lasers irradiating Si (001) samples immersed in a liquid environment with low number of pulses and operating at moderately low pulse fluences to induce Si wettability modification. Wafers immersed for up to 4 hr in a 0.01% H 2 O 2 /H 2 O solution did not show measurable change in their initial contact angle (CA) ~75°. However, the 500-pulse KrF and ArF lasers irradiation of such wafers in a microchamber filled with 0.01% H 2 O 2 /H 2 O solution at 250 and 65 mJ/cm 2 , respectively, has decreased the CA to near 15°, indicating the formation of a superhydrophilic surface. The formation of OH-terminated Si (001), with no measurable change of the wafer's surface morphology, has been confirmed by X-ray photoelectron spectroscopy and atomic force microscopy measurements. The selective area irradiated samples were then immersed in a biotin-conjugated fluorescein-stained nanospheres solution for 2 hr, resulting in a successful immobilization of the nanospheres in the non-irradiated area. This illustrates the potential of the method for selective area biofunctionalization and fabrication of advanced Si-based biosensing architectures. We also describe a similar protocol of irradiation of wafers immersed in methanol (CH 3 OH) using ArF laser operating at pulse fluence of 65 mJ/cm 2 and in situ formation of a strongly hydrophobic surface of Si (001) with the CA of 103°. The XPS results indicate ArF laser induced formation of Si-(OCH 3 ) x compounds responsible for the observed hydrophobicity. However, no such compounds were found by XPS on the Si surface irradiated by KrF laser in methanol, demonstrating the inability of the KrF laser to photodissociate methanol and create -OCH 3 radicals. Video LinkThe video component of this article can be found at

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Tuning cell adhesion by controlling the roughness and wettability of 3D micro/nano silicon structures

Cited by 412 publications

References 56 publications

Colloidal assemblies of oriented maghemite nanocrystals and their NMR relaxometric properties

Colloidal assemblies of oriented maghemite nanocrystals and their NMR relaxometric properties

Femtosecond laser-induced microstructures on Ti substrates for reduced cell adhesion

Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment

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