2023
DOI: 10.1039/d3ta00466j
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Tungsten dichalcogenide WS2xSe2−2x films via single source precursor low-pressure CVD and their (thermo-)electric properties

Abstract: Semiconducting transition metal dichalcogenides have gained increased interest as potential alternatives to graphene due to their tunable electronic bandgaps. In this study, we present the deposition of stoichiometric WS2xSe2-2x (0...

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Cited by 3 publications
(7 citation statements)
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“…This morphology is common for thin films of TMDs grown via CVD. 34,39,61 For films grown at the same temperature with the different precursors: 1 , 2 , and 3 , the size of the platelets increased with the number of dithiolene ligands present (Fig. 8).…”
Section: Resultsmentioning
confidence: 96%
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“…This morphology is common for thin films of TMDs grown via CVD. 34,39,61 For films grown at the same temperature with the different precursors: 1 , 2 , and 3 , the size of the platelets increased with the number of dithiolene ligands present (Fig. 8).…”
Section: Resultsmentioning
confidence: 96%
“…37,38 WSCl 4 (S n Bu 2 ) used in LPCVD experiments yielded 2H-WS 2 thin films on silicon substrates from 624–650 °C. 39 [(WSCl 4 ) 2 ( i PrS(CH 2 ) 2 S i Pr)] was used in low pressure CVD trials to deposit 2H-WS 2 onto silica substrates at 700 °C. 40 CVD at 600 °C using [W(SEtN(Me)EtS) 2 ] resulted in 2H-WS 2 thin films deposited onto silicon substrates.…”
Section: Introductionmentioning
confidence: 99%
“…Binary and ternary WS 2x Se 2−2x thin films were deposited using the precursors WECl 4 (E′ n Bu 2 ) (28: E, E′ = S; 29: E = S, E′ = Se; 30: E, E′ = Se; 31: E = Se, E′ = S) in low-pressure CVD experiments. 86,87 The precursors were synthesized by The combination of a terminal sulfido ligand with thioether ligands was also utilized in the precursors [NbSCl 3 (S n Bu 2 )] 2 (32) and NbSCl 3 ( n BuS(CH 2 ) 3 S n Bu) (33) to deposit thin films of 3R-NbS 2 on glass substrates via low-pressure CVD at 0.05 mmHg and 700 °C. 88 Complex 32 was synthesized by reaction of NbCl 5 and S n Bu 2 , followed by the addition of S(SiMe 3 ) 2 .…”
Section: ■ Precursor Designmentioning
confidence: 99%
“…Binary and ternary WS 2 x Se 2–2 x thin films were deposited using the precursors WECl 4 (E′ n Bu 2 ) ( 28 : E, E′ = S; 29 : E = S, E′ = Se; 30 : E, E′ = Se; 31 : E = Se, E′ = S) in low-pressure CVD experiments. , The precursors were synthesized by reacting either WSCl 4 or WSeCl 4 with a neutral chalcogenoether (S n Bu 2 or Se n Bu 2 ) in DCM. The precursors containing terminal sulfido ligands were found to be more stable than those containing terminal selenido ligands.…”
Section: Precursor Designmentioning
confidence: 99%
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