Tunable ion-swelling for nanopatterning of macroscopic surfaces: The role of proximity effects

Nagy, Norbert; Zolnai, Zsolt; Fülöp, E.; Deák, András; Bársony, I.

doi:10.1016/j.apsusc.2012.07.045

Cited by 10 publications

(15 citation statements)

References 40 publications

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“…9 for small inter-particle distances reaches ~ 40 nm at the maximum, being comparable to the results of Lindner et al [11] and Nagy et al [7].…”

Section: Accepted M Manuscriptsupporting

confidence: 80%

“…7 and 8 reveal swelling spikes and interconnected rims. The spikes emerge between free adjacent particles which are interconnected by necks thus forming a triangular "bridge" [7,11]. This triangular "bridge" also acts as mask and prevents the underlying Si surface from significant swelling.…”

Section: Accepted M Manuscriptmentioning

confidence: 99%

“…The physical parameters playing crucial role in such effects are ion energy, ion mass, particle size and shape, particle-particle distance and the initial self-organization of particles in the LB monolayer [5,6]. So far low mass ions like He + [11], medium mass ions like Ar + or Ga + [5,6], and heavy ions like Xe + [12,13], Xe 2+ [7,14] or Xe 4+ [15] have been used for the irradiation of various materials and study of the above mentioned phenomena.…”

Section: Accepted M Manuscriptmentioning

confidence: 99%

“…At the particle edges, however, there is a fluence transition region which can be narrower or wider, depending on the ion energy, particle diameter and the average inter-particle distance. The swelling profile significantly depends on the ratio between the transition region and the inter-particle distance [7].…”

Section: Accepted M Manuscriptmentioning

confidence: 99%

“…At low and medium fluence this process depends on the charging of particles and relation between Coulomb and friction forces [5,6], proximity effects [7,8] and the swelling of the silicon substrate. At high fluence, discharging and thermal effects like 2D surface…”

Section: Introductionmentioning

confidence: 99%

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“…9 for small inter-particle distances reaches ~ 40 nm at the maximum, being comparable to the results of Lindner et al [11] and Nagy et al [7].…”

Section: Accepted M Manuscriptsupporting

confidence: 80%

Section: Accepted M Manuscriptmentioning

confidence: 99%

Section: Accepted M Manuscriptmentioning

confidence: 99%

Section: Accepted M Manuscriptmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Shape, size, and atomic composition analysis of nanostructures in 3D by Rutherford backscattering spectrometry

Zolnai

2013

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CoPt/TiN films nanopatterned by RF plasma etching towards dot-patterned magnetic media

Szívós

Pothorszky

Šoltýs

et al. 2018

Applied Surface Science

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Applied Surface Science, because a novel and general (applicable to wide variety of material surfaces and thin films) nanopatterning technique proposed by the authors eariler, is applied here to successfully fabricate dot-patterned CoPt thin films exhibiting perpendicular magnetism. The manuscript topic fits nicely to the accommodated topics as it deals with 2D assembly and nanopatterning of sputter deposited magnetic CoPt thin films. Our results can be considered as a possibility to realize Bit Patterned Media (BPM). Thus, our paper should be of service for researchers interested in fabricating ordered nanopatterns, in particular perpendicular magnetic dot-patterned thin films. Moreover, the technique applied in this paper can easily be scaled to industrial throughput and it is relatively cheap.Cover Letter A C C E P T E D M A N U S C R I P T Highlights  A novel nanopatterning technique proposed recently is applied to CoPt thin films  CoPt films are transformed to L1 0 structure both before and after nanopatterning  Dot-patterned CoPt films with surface-perpendicular magnetic easy axis were obtained  Feature size can be reduced to <20nm and possible to scale to industrial throughput  Our work can be considered as a possibility to realize Bit Patterned Media (BPM) *Highlights (for review) Responses to the Editor and ReviewersEditor:The authors thank to Editor for the remarks. The format of the citations is changed to show all the authors and some more citations towards Applied Surface Science are added to the manuscript. The XRD scales in Figure 4 are corrected as well.Reviewer #1:The authors are thankful to Reviewer #1 for the useful comments and remarks. Here are our answers point-by-point: 1) Magnetic properties of the continues film is missing in current manuscript. I suggest add the in-plane and out-of-plane M-H loop to Fig. 8(a). So that the effect of dot geometry can be clearly observed.The magnetic properties of the annealed but non-patterned CoPt films are described in the authors' previous paper [1]. However, this fact was not mentioned in the in the "magnetic properties" section of the current manuscript. The previous paper was only cited in other sections of the current manuscript. For comparison, the VSM result of an annealed but nonpatterned CoPt film from our previous paper [1] is shown here together with the VSM Fig. 8(a) from the current manuscript. *Response to ReviewersAs it is seen, the two perpendicular measurements are very similar (besides the noise). The coercive force of the patterned sample seems to be somewhat larger, but this can't be stated due to the noise of the measurement. On the other hand, the in-plane hysteresis loop is way smaller in the case of the patterned sample. A few words about this comparison are added to the "magnetic properties section" of the current manuscript together with a citation to our previous paper.2) It will be good also compare the M-H loop before and after annealing. For both dot array and continuous film.For comparison, the Fig 8(a) of the manusc...

show abstract

Tunable ion-swelling for nanopatterning of macroscopic surfaces: The role of proximity effects

Cited by 10 publications

References 40 publications

Ar+ ion irradiation-induced reorganization of colloidal silica nanoparticles in Langmuir–Blodgett monolayers

Ar+ ion irradiation-induced reorganization of colloidal silica nanoparticles in Langmuir–Blodgett monolayers

Shape, size, and atomic composition analysis of nanostructures in 3D by Rutherford backscattering spectrometry

CoPt/TiN films nanopatterned by RF plasma etching towards dot-patterned magnetic media

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