2017
DOI: 10.1080/02670844.2016.1212519
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Tunable electrical resistivity of oxygen-deficient zinc oxide thin films

Abstract: Oxygen-deficient zinc oxide thin films were deposited by radio frequency magnetron sputtering with a sintered zinc oxide ceramic target under an atmosphere of manipulated sputtering gas pressure (SGP). Under the designed deposition conditions, all the prepared films were of hexagonal würtzite structure with c-axis as the preferential growth orientation. With increasing SGP, the film thickness, deposition rate, grain size and atomic ratio of O to Zn in the films initially increased and then decreased. Interesti… Show more

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Cited by 20 publications
(13 citation statements)
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“…For comparison, the result on the as-deposited ZnO 0.81 film is also presented. The lattice constant of the as-deposited ZnO 0.81 thin film is 5.1668 Å, smaller than that of stoichiometric ZnO (5.2066 Å)20, implying that the applied ZnO 0.81 thin film is an oxygen-deficient one with lots of oxygen vacancies1121. However, after hot-dipping at the designed temperatures, the lattice constant for the samples increased, although all of them were still less than 5.2066 Å (more or less).…”
Section: Phase Composition and Defect Statementioning
confidence: 93%
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“…For comparison, the result on the as-deposited ZnO 0.81 film is also presented. The lattice constant of the as-deposited ZnO 0.81 thin film is 5.1668 Å, smaller than that of stoichiometric ZnO (5.2066 Å)20, implying that the applied ZnO 0.81 thin film is an oxygen-deficient one with lots of oxygen vacancies1121. However, after hot-dipping at the designed temperatures, the lattice constant for the samples increased, although all of them were still less than 5.2066 Å (more or less).…”
Section: Phase Composition and Defect Statementioning
confidence: 93%
“…For details, please check them in refs 6 and 11. Then the as-deposited ZnO 0.81 thin film samples were buried in Pr 6 O 11 powder in a half-covered alumina crucible, and heated in a muffle furnace at a temperature of 300, 400, 500, 600, 700 and 800 °C, respectively, for an optimized time of 50 min (see Extended Data Fig.…”
Section: Methodsmentioning
confidence: 99%
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“…X‐ray photoelectron spectroscopy (XPS; Thermo Fisher, nonmonochromated Al K α radiation, photon energy 1486.7 eV, Waltham, MA, USA) was used to examine the films composition and elementally chemical state. For the XPS characterization, the correction of the energy shift of the samples was carried out by referencing it to the C 1s line (284.6 eV) . The electrochemical impedance spectra of the samples were recorded by an electrochemical workstation (CHI660E; Chenghua Instrument Company, China), and the impedance data were analyzed by the ZSimpWin software.…”
Section: Methodsmentioning
confidence: 99%