Triplasmatron sources for broad and reactive ion beams

Lejeune, C; Grandchamp, J. P.; Kessi, O; Gilles, Jean-Paul

doi:10.1016/0042-207x(86)90125-9

Cited by 10 publications

(2 citation statements)

References 9 publications

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“…7 We have developed several procedures for running SF 6 in a duoplasmatron that minimize these effects. The most promising approach is to modify the duoplasmatron to operate in the triplasmatron configuration as originally described by Masic et al, 8 Aubert et al 9 and Gautherin et al 10 In a triplasmatron ion source, the plasma jet from a duoplasmatron operating with an inert gas such as argon is allowed to expand into an apertured and conducting ''expansion cup'' mounted on the extraction side of the anode aperture of the source ͑expansion cups are commonly used in plasma beam ion sources to reduce the plasma density making for easier beam formation and transport 11 ͒.…”

Section: Introductionmentioning

confidence: 99%

Development of a triplasmatron ion source for the generation of SF5+ and F− primary ion beams on an ion microscope secondary ion mass spectrometry instrument

Gillen

King

Chmara³

1999

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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A hot filament duoplasmatron ion source operating with argon has been modified by the addition of an enclosed expansion cup mounted to the extraction side of the duoplasmatron anode. Using sulfur hexafluoride (SF6) as a feed gas, this triplasmatron ion source has been used to generate SF5+ and F− primary ion beams for secondary ion mass spectrometry (SIMS). For positive primary ions, the current extracted from the source is composed of a series of SFx+ cluster ions (x=1–5) with the SF5+ ion being the most intense. SF5+ currents of ∼ 10–20 nA with a maximum of 40 nA are obtained at an extraction voltage of 10 kV. By applying a positive bias to the expansion cup, a localized secondary arc discharge is initiated giving 200 nA–300 nA of SF5+ with a current density of 0.5 mA/cm2. Depending on the operating parameters of the source, lifetimes of greater than 70 h have been achieved. For negative primary ions (with the cup removed), the current extracted from the source is primarily composed of F− ions with a maximum current of 3 μA. The source can be briefly dosed with SF6 and will generate F- beams for 1–2 days without any additional gas being added. Evaluation of the SF5+ and F− ion beams for common SIMS applications demonstrates that these novel primary beams offer significant advantages for depth profiling, organic surface characterization and imaging.

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Section: Introductionmentioning

confidence: 99%

Development of a triplasmatron ion source for the generation of SF5+ and F− primary ion beams on an ion microscope secondary ion mass spectrometry instrument

Gillen

King

Chmara³

1999

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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“…This gun has been especially developed in order to satisfy the various requirements of ion-beam assisted processeseither deposition or etching. In particular a steadystate operation may be reached for the operation with fluorocarbon gases which generally leads to the deposition of insulating films on the chamber walls or electrodes [12]. Because of the small anode the temperature of which may be far above room temperature no deposition occurs on the anode which conversely is slowly etched.…”

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confidence: 99%