1960
DOI: 10.1111/j.1151-2916.1960.tb13681.x
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Trapped Electrons in Irradiated Quartz and Silica: I, Optical Absorption

Abstract: Evidence is given for the correlation between an optical absorption band at 2300 a.u. and an electron spin resonance system developed in quartz after 6oCo y-irradiation. The results of bleaching 7-irradiated quartz and silica at 78°K. and at room temperature are presented and discussed. Also, further observations upon annealing these color centers are given.

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Cited by 159 publications
(22 citation statements)
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“…10 well replicates the Al-OHC spectra reported for Al-doped silica glasses [15,25]. The optical band at 4.1 eV also accompanies presence of aluminum irradiated silica glass and quartz [23], whereas the one at 5.5 eV likely belongs to the Si-E' center since a band at 5.4 eV in irradiated a quartz [26] has been correlated with the Si E 0 2 center in quartz [27] and an Si-E 0 -center ESR signal is observed in Fig. 10.…”
Section: Radiation Effects In Silica Doped With Alsupporting
confidence: 77%
“…10 well replicates the Al-OHC spectra reported for Al-doped silica glasses [15,25]. The optical band at 4.1 eV also accompanies presence of aluminum irradiated silica glass and quartz [23], whereas the one at 5.5 eV likely belongs to the Si-E' center since a band at 5.4 eV in irradiated a quartz [26] has been correlated with the Si E 0 2 center in quartz [27] and an Si-E 0 -center ESR signal is observed in Fig. 10.…”
Section: Radiation Effects In Silica Doped With Alsupporting
confidence: 77%
“…Therefore, the FWHM of 1.2 eV is more reliable for the 5.8-eV band. Although the Si EЈ center is known to have absorption at 5.8-eV, 32,33 there is no possibility of the present 5.8-eV band being due to the Si EЈ center since the ESR signal of the Si EЈ center never appeared. Therefore, the present 5.8-eV band is due to the same origin in both samples N and H, and the origin is the GEC with the Ge͑1͒ ESR signal.…”
Section: Assignment Of the 58-ev Absorptionmentioning
confidence: 88%
“…The impurity species involved in this process may be Al, Li, and Na, whose concentrations ($1-2 Â 10 15 cm À3 ) are comparable to C 0 , and, possibly, SiOH groups, which were undetected, although their detection limit (Շ10 17 cm À3 ) was larger than C 0 . The growth of the weak, non-saturating OA at $6 eV with increasing D may be the result of silicon dangling bonds, 32 which can be formed by the decomposition of SiASi bonds.…”
Section: Discussionmentioning
confidence: 99%